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Volumn 82, Issue 6, 1999, Pages 1605-1607

Conversion efficiency of alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-CVD) process

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; NICKEL ALLOYS; POLYCRYSTALLINE MATERIALS; PYROLYSIS; TITANIUM DIOXIDE; ZIRCONIA;

EID: 0032652998     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1999.tb01968.x     Document Type: Article
Times cited : (35)

References (13)
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  • 2
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    • (1981) Thin Solid Films , vol.77 , pp. 81-90
    • Blandenet, G.1    Court, M.2    Lagarde, Y.3
  • 6
    • 0024704203 scopus 로고
    • Growth of zinc oxide films by a novel ultrasonic nebulization and pyrolysis method
    • P. Wu, Y.-M. Gao, J. Baglio, R. Kershaw, K. Dwight, and A. Wold. "Growth of Zinc Oxide Films by a Novel Ultrasonic Nebulization and Pyrolysis Method," Mater. Res. Bull., 24, 905-11 (1989).
    • (1989) Mater. Res. Bull. , vol.24 , pp. 905-911
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  • 8
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    • The crystal structure of rutile as a function of temperature up to 1600°C
    • K. Sugiyama and Y. Takeuchi, "The Crystal Structure of Rutile as a Function of Temperature up to 1600°C," Z. Kristallogr., 194, 305-13 (1991).
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    • Sugiyama, K.1    Takeuchi, Y.2
  • 9
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    • Some practical aspects of corosion and coatings in utility gas turbines
    • H. W. Grunling, H. Rechtenbacher, and L. Singheiser, "Some Practical Aspects of Corosion and Coatings in Utility Gas Turbines," Mater. Sci. Forum, 251-254, 438-502 (1997).
    • (1997) Mater. Sci. Forum , vol.251-254 , pp. 438-502
    • Grunling, H.W.1    Rechtenbacher, H.2    Singheiser, L.3
  • 10
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    • Ch. 6. Edited by M. L. Hitchman and K. F. Jensen. Academic Press-Harcourt Brace Jovanovich, London, U.K.
    • R. L. Moon and Y. M. Houng, Chemical Vapor Deposition; Ch. 6. Edited by M. L. Hitchman and K. F. Jensen. Academic Press-Harcourt Brace Jovanovich, London, U.K., 1993.
    • (1993) Chemical Vapor Deposition
    • Moon, R.L.1    Houng, Y.M.2
  • 11
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    • Kinetic and mechanistic study of the chemical vapor deposition of titanium dioxide thin films using tetrakis-(isopropoxo)-titanium(IV)
    • C. P. Fictorie, J. F. Evans, and W. L. Gladfelter, "Kinetic and Mechanistic Study of the Chemical Vapor Deposition of Titanium Dioxide Thin Films Using tetrakis-(isopropoxo)-titanium(IV)," J. Vac. Sci. Technol., 12, 1108-13 (1994).
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    • Studies of titanium dioxide film growth from titanium tetraisopropoxide
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    • Chen, Z.-X.1    Derking, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.