The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering

Applied Surface Science

Volumn 254, Issue 16, 2008, Pages 5012-5015

  Zhang, Guangan ^a,b   Yan, Pengxun ^a,b   Wu, Zhiguo ^a   Wang, Jun ^a   Chen, Jiangtao ^a  

^a LANZHOU UNIVERSITY   (China)

^b LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

Copper nitride; Hydrogen; Structure; Thermal properties; Thin films

Indexed keywords

COPPER COMPOUNDS; HYDROGEN; LATTICE CONSTANTS; MAGNETRON SPUTTERING; SILICON WAFERS; THERMODYNAMIC PROPERTIES;

COPPER NITRIDE THIN FILMS; RELATIVE COMPOSITION;

THIN FILMS;

EID: 43049154542     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.01.156     Document Type: Article

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