Vapor pressure of metal organic precursors

Journal of Crystal Growth

Volumn 248, Issue SUPPL., 2003, Pages 99-107

  Fulem, M ^a   Ruzicka K ^a   Ruzicka V ^a   Hulicius, E ^b   Simecek T ^b   Melichar, K ^b   Pangrac J ^b   Rushworth, S A ^c   Smith, L M ^c  

^a INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c Epichem Ltd   (United Kingdom)

Author keywords

A1. Organometallic precursors; A1. Static method; A1. Vapor pressure; A3. Metalorganic vapor phase epitaxy

Indexed keywords

ENTHALPY; METALLORGANIC VAPOR PHASE EPITAXY; OPTOELECTRONIC DEVICES; VAPOR PRESSURE;

STATIC METHOD;

ORGANOMETALLICS;

EID: 0037291813     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)01840-7     Document Type: Conference Paper

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