Influence of thermal annealing ambient on Ga-doped ZnO thin films

Journal of Crystal Growth

Volumn 309, Issue 2, 2007, Pages 128-133

  Du Ahn, Byung ^a   Hoon Oh, Sang ^a   Hee Lee, Choong ^a   Hee Kim, Gun ^a   Jae Kim, Hyun ^a   Yeol Lee, Sang ^b  

^a Yonsei University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

A1. Adsorption; A1. Defects; A1. Desorption; A1. Doping; B2. Semiconducting II VI materials

Indexed keywords

ADSORPTION; CHEMISORPTION; DESORPTION; HEAT TREATMENT; NITROGEN; OPTICAL PROPERTIES; OXYGEN; SEMICONDUCTOR MATERIALS; THIN FILMS; ZINC OXIDE;

ADSORBED OXYGEN; THERMAL ANNEALING;

METALLIC FILMS;

EID: 36048972012     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.09.014     Document Type: Article

References (30)

1. Minami T. Semicond. Sci. Technol. 20 (2005) S35
2. Kim J.H., Jeon K.A., Kim G.H., and Lee S.Y. Appl. Surf. Sci. 252 (2006) 4834
3. Özgür U., Alivov Ya.I., Liu C., Teke A., Reshchikov M.A., Doǧan S., Avrutin V., Cho S.-J., and Morkoç H. J. Appl. Phys. 98 (2005) 041301
4. Fortunato E., Assuncao V., Goncalves A., Marques A., Aguas H., Pereira L., Ferreira I., Vilarinho P., and Martins R. Thin Solid Films 451-52 (2004) 443
5. Kim J.H., Ahn B.D., Lee C.H., Jeon K.A., Kang H.S., and Lee S.Y. J. Appl. Phys. 100 (2006) 113515
6. Cheong K.Y., Muti N., and Ramanan S.R. Thin Solid Films 410 (2002) 142
7. Ye J.D., Gu S.L., Zhu S.M., Liu S.M., Zheng Y.D., Zhang R., Shi Y., Yu H.Q., and Ye Y.D. J. Crystal Growth 283 (2005) 279
8. Nunes P., Fortunato E., and Martins R. Int. J. Inorg. Mater. 3 (2001) 1125
9. Hamad O., Braunstein G., Patil H., and Dhere N. Thin Solid Films 489 (2005) 303
10. Ye J.D., Gu S.L., Zhu S.M., Qin F., Liu S.M., Liu W., Zhou X., Hu L.Q., Zhang R., Shi Y., and Zheng Y.D. J. Appl. Phys. 96 (2004) 5308
11. Van de Walle C.G. Phys. Rev. Lett. 85 (2000) 1012
12. Kang J.S., Kang H.S., Pang S.S., Shim E.S., and Lee S.Y. Thin Solid Films 443 (2003) 5
13. Minami T., Nanto H., Shooji S., and Takata S. Thin Solid Films 111 (1984) 167
14. Lee J.H., Yeo B.W., and Park B.O. Thin Solid Films 457 (1984) 333
15. Ko H.J., Chen Y.F., Hong S.K., Wenisch H., Yao T., and Look D.C. Appl. Phys. Lett. 77 (2000) 3761
16. Sagalowicz L., and Fox G.R. J. Mater. Res. 14 (1999) 1875
17. Major S., Kumar S., Bhatnagar M., and Chopra K.L. Appl. Phys. Lett. 40 (1986) 394
18. Islam M.N., Ghosh T.B., Chopra K.L., and Acharya H.N. Thin Solid Films 280 (1996) 20
19. Rao L.K., and Vinni V. Appl. Phys. Lett. 63 (1993) 608
20. Fan J.C.C., and Goodenough J.B. J. Appl. Phys. 48 (1997) 3524
21. Takahashi Y., Kanamori M., Kondoh A., Minoura H., and Ohya Y. Jpn. J. Appl. Phys. 33 (1994) 6611
22. Zhang D.H., and Brodie D.E. Thin Solid Films 238 (1994) 95
23. Studenikin S.A., Golego N., and Cocivera M. J. Appl. Phys. 87 (2000) 2413
24. Tansley T.L., and Neely D.F. Thin Solid Films 121 (1984) 95
25. Kamins T.I. J. Appl. Phys. 42 (1971) 4357
26. Kenigsberg L., and Chernets A.N. Sov. Phys. Solid State 10 (1969) 2235
27. Djaoued Y., Phong V.H., Badilescu S., Ashrit P.V., Girouard F.E., and Truong V.-V. Thin Solid Films 293 (1997) 108
28. Donga B.-Z., Fang G.-J., Wang J.-F., Guan W.-J., and Zhao X.-Z. J. Appl. Phys. 101 (2007) 033713
29. Lee G.H., Yamamoto Y., Kourogi M., and Ohtsu M. Thin Solid Films 386 (2001) 117
30. Klingshirn C.F. Semiconductor Optics (1995), Springer, Berlin p. 171