Low-temperature atomic layer deposition of ZnO thin films: Control of crystallinity and orientation

Thin Solid Films

Volumn 519, Issue 16, 2011, Pages 5319-5322

  Malm, Jari ^a   Sahramo, Elina ^a   Perälä, Juho ^a   Sajavaara, Timo ^b   Karppinen, Maarit ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

Atomic layer deposition; Crystallinity; Low temperature; Orientation; Zinc oxide

Indexed keywords

CRYSTALLINITIES; CRYSTALLINITY; DIETHYLZINC; FILM CRYSTALLINITY; FILM ORIENTATIONS; FILM PROPERTIES; HIGH QUALITY; LOW TEMPERATURES; ORIENTATION; POST DEPOSITION ANNEALING; ROOM TEMPERATURE; SI (100) SUBSTRATE; TEMPERATURE RANGE; ZNO THIN FILM;

ATOMIC LAYER DEPOSITION; ATOMS; BIOLOGICAL MATERIALS; COATED MATERIALS; METALLIC FILMS; OPTICAL FILMS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

DEPOSITION;

EID: 79958001841     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.024     Document Type: Article

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