The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition

Materials Science and Engineering: B

Volumn 176, Issue 3, 2011, Pages 237-241

  Luka, G ^a   Wachnicki, L ^a   Witkowski, B S ^a   Krajewski, T A ^a   Jakiela, R ^a   Guziewicz, E ^a   Godlewski, M ^a,b  

^a INSTITUTE OF PHYSICS   (Poland)

^b CARDINAL STEFAN WYSZY SKI UNIVERSITY   (Poland)

Author keywords

Aluminum doped zinc oxide; Atomic layer deposition; Thin films

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; ATOMS; II-VI SEMICONDUCTORS; METALLIC FILMS; OPTICAL FILMS; ZINC OXIDE;

AL CONTENT; AL DISTRIBUTION; ALUMINIUM CONTENT; ALUMINUM DOPED ZINC OXIDE FILMS; ALUMINUM-DOPED ZINC OXIDE; ATOMIC-LAYER DEPOSITION; MORPHOLOGY STRUCTURES; NITROGEN ATMOSPHERES; THIN-FILMS; ZNO:AL FILMS;

THIN FILMS;

EID: 79551686586     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.11.014     Document Type: Article

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