Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism

Chemistry of Materials

Volumn 18, Issue 16, 2006, Pages 3764-3773

  Elliott, S D ^a   Scarel, G ^b   Wiemer, C ^b   Fanciulli, M ^b   Pavia, G ^c  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b LABORATORIO MDM   (Italy)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL REACTORS; DEPOSITION; GROWTH KINETICS; MORPHOLOGY; OZONE; REACTION KINETICS;

ATOMIC LAYER DEPOSITION; HYDROXYL GROUPS; MOLAR GROWTH RATES; TRIMETHYLALUMINUM (TMA);

ALUMINA;

EID: 33748258535     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0608903     Document Type: Article

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