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Current Applied Physics

Volumn 11, Issue 1 SUPPL., 2011, Pages

Characteristics of transparent conducting Al-doped ZnO films prepared by dc magnetron sputtering

(4) Jung, Sung Mok a,b Kim, Young Hwan a Kim, Seong Il a Yoo, Sang Im b

a Korea Institute of Science and Technology (South Korea)

b Seoul National University (South Korea)

Author keywords

Al doped ZnO; DC magnetron sputtering; Oxygen partial pressure; Substrate temperature

Indexed keywords

AL-DOPED ZNO; ARGON GAS PRESSURE; AZO FILMS; DC MAGNETRON SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; GAS RATIO; HIGH TRANSPARENCY; LOW RESISTIVITY; OXYGEN PARTIAL PRESSURE; ROOM TEMPERATURE; SODA LIME GLASS SUBSTRATE; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTING OXIDE FILMS; VISIBLE REGION;

ALUMINUM; ARGON; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; FILM PREPARATION; GASES; MAGNETRON SPUTTERING; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; PARTIAL PRESSURE; POSITIVE IONS; ZINC OXIDE;

SUBSTRATES;

EID: 79953180872 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2010.11.101 Document Type: Conference Paper

Times cited : (35)

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