SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 159, Issue 2, 2012, Pages

Fabrication of ordered silicon wire structures via macropores without pore wall by electrochemical etching

(4) Jang, Hwan Soo a Choi, Ho Jin b Lee, Hochun a Kim, Jae Hyun a

a Daegu Gyeongbuk Institute of Science and Technology (South Korea)

b Heesung Electronics Ltd (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BACK CONTACT; ETCHING DEPTH; ETCHING RATE; HIGH ASPECT RATIO; MACROPORES; MULTILAYER STRUCTURES; PORE WALL; SILICON STRUCTURES; SILICON WIRES;

ASPECT RATIO; WIRE;

ELECTROCHEMICAL ETCHING;

EID: 84855323203 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/2.001202jes Document Type: Article

Times cited : (8)

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