Effect of the composition of electrolyte on separation of porous silicon film by electrochemical etching

Physica Status Solidi (A) Applied Research

Volumn 197, Issue 2, 2003, Pages 507-511

  Solanki, C S ^a   Bilyalov, R R ^a   Poortmans, J ^a   Celis, J P ^b   Nijs, J ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; COMPOSITION EFFECTS; CURRENT DENSITY; ELECTROCHEMISTRY; ELECTROLYTES; SEPARATION; SUBSTRATES; THIN FILMS;

ELECTROCHEMICAL ETCHING; POROUS SILICON FILM; SILICON SUBSTRATES;

POROUS SILICON;

EID: 0038609622     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200306554     Document Type: Conference Paper

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