Toward the formation of three-dimensional nanostructures by electrochemical etching of silicon

Applied Physics Letters

Volumn 86, Issue 18, 2005, Pages 1-3

  Kleimann, P ^a   Badel, X ^b   Linnros, J ^b  

^a UNIVERSITÉ LYON 1   (France)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING; LITHOGRAPHY; LOW ENERGY ELECTRON DIFFRACTION; MACHINING; MASKS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OXIDES;

ELECTROCHEMICAL ETCHING; ISOTROPIC ETCHING; PILLARS; PROCESS FLOWS;

SILICON;

EID: 20944451255     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1924883     Document Type: Article

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