Optimization of wire array formation in p-type silicon for solar cell application

Current Applied Physics

Volumn 11, Issue 1 SUPPL., 2011, Pages

  Jang, Hwan Soo ^a   Oh, Byeong Yun ^b   Choi, Ho Jin ^a   Baek, Seong Ho ^a   Kim, Seong Been ^a   Kim, Jae Hyun ^a  

^a Daegu Gyeongbuk Institute of Science and Technology   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

Electrochemical etching; Etch pit; Silicon wire array; Solar cell

Indexed keywords

APPLIED CURRENT; COUNTER ELECTRODES; ETCH PIT; ETCHING PROCESS; ETCHING TIME; OPTIMIZED ETCHING; P-TYPE; P-TYPE SILICON; PORE WALL; SILICON WIRE ARRAY; SILICON WIRES; SILICON-BASED; SOLAR-CELL APPLICATIONS; WIRE ARRAYS;

ASPECT RATIO; ELECTROCHEMISTRY; OPTIMIZATION; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOLAR CELLS; WIRE;

ELECTROCHEMICAL ETCHING;

EID: 79953214894     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.11.037     Document Type: Conference Paper

References (20)

1. M.D. Kelzenberg, S.W. Boettcher, J.A. Petykiewicz, D.B. Turner-Evans, M.C. Putnam, E.L. Warren, J.M. Spurgeon, R.M. Briggs, N.S. Lewis, and H.A. Atwater Nat. Mater. 9 2010 239
2. T. Stelzner, M. Pietsch, G. Andrä, F. Falk, E. Ose, and S. Christiansen Nanotechnology 19 2008 295203
3. P. Bettotti, L.D. Negro, Z. Gaburro, L. Pavesi, A. Lui, M. Galli, M. Patrini, and F. Marabelli J. Appl. Phys. 92 2002 6966
4. Y. Cui, Z. Zhong, D. Wang, W.U. Wang, and C.M. Lieber Nano Lett. 3 2003 149
5. B.M. Kayes, H.A. Atwater, and N.S. Lewis J. Appl. Phys. 97 2005 114302
6. E.C. Garnett, and P. Yang J. Am. Chem. Soc. 130 2008 9224
7. L. Tsakalakos, J. Balch, J. Fronheiser, B.A. Korevaar, O. Sulima, and J. Rand Appl. Phys. Lett. 91 2007 233117
8. K.E. Plass, M.A. Filler, J.M. Spurgeon, B.M. Kayes, S. Maldonado, B.S. Brunschwig, H.A. Atwater, and N.S. Lewis Adv. Mater. 21 2009 325
9. G. Barillaro, A. Nannini, and F. Pieri J. Electrochem. Soc. 149 2002 C180
10. P. Kleimann, J. Linnros, and S. Petersson Mater. Sci. Eng. B. 69-70 2000 29
11. P. Kleimann, X. Badel, and J. Linnros Appl. Phys. Lett. 86 2005 183108
12. V. Lehmann, and H. Föll J. Electrochem. Soc. 137 1990 653
13. M.H.A. Rifai, M. Christophersen, S. Ottow, J. Carstensen, and H. Föll J. Electrochem. Soc. 147 2000 627
14. F.A. Harraz, K. Kamada, K. Kobayashi, T. Sakka, and Y.H. Ogata J. Electrochem. Soc. 152 2005 C213
15. S. Lust, and C. Lévy-Clément J. Electrochem. Soc. 149 2002 C338
16. A. Vyatkin, V. Starkov, V. Tzeitlin, H. Presting, J. Konle, and U. König J. Electrochem. Soc. 149 2002 G70
17. V. Lehmann Thin Solid Films 255 1995 1
18. J.E.A.M. van den Meerakker, R.J.G. Elfrink, F. Roozeboom, and J.F.C.M. Verhoeven J. Electrochem. Soc. 147 2000 2757
19. C. Lévy-Clément, S. Lust, S. Bastide, Q.N. Lê, and D. Sarti Phys. Status Solidi A 197 2003 27
20. Z. Huang, T. Shimizu, S. Senz, Z. Zhang, X. Zhang, W. Lee, N. Geyer, and U. Gösele Nano Lett. 9 2009 2519