Combinational approach of electrochemical etching and metal-assisted chemical etching for p-type silicon wire formation

Electrochemical and Solid-State Letters

Volumn 14, Issue 1, 2011, Pages

  Jang, Hwan Soo ^a   Choi, Ho Jin ^a   Oh, Byeong Yun ^b   Kim, Jae Hyun ^a  

^a Daegu Gyeongbuk Institute of Science and Technology   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCH PITS; KOH ETCHING; MANUFACTURING COST; METAL-ASSISTED CHEMICAL ETCHING; NEW PROCESS; P-TYPE SILICON; SILICON SUBSTRATES; SILICON WIRES;

ASPECT RATIO; CRYSTAL ORIENTATION; HYDROFLUORIC ACID; POROUS SILICON; POTASSIUM HYDROXIDE; WIRE;

ELECTROCHEMICAL ETCHING;

EID: 78751472065     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3504127     Document Type: Article

References (24)

1. F. A. Harraz, K. Kamada, K. Kobayashi, T. Sakka, and Y. H. Ogata, J. Electrochem. Soc., 152, C213 (2005). 10.1149/1.1864292 (Pubitemid 40636217)
2. S. Lust and C. Ĺvy-Cĺment, J. Electrochem. Soc., 149, C338 (2002). 10.1149/1.1475688 (Pubitemid 34697441)
3. G. Barillaro, A. Nannini, and F. Pieri, J. Electrochem. Soc., 149, C180 (2002). 10.1149/1.1449953 (Pubitemid 34325874)
4. A. Vyatkin, V. Starkov, V. Tzeitlin, H. Presting, J. Konle, and U. König, J. Electrochem. Soc., 149, G70 (2002). 10.1149/1.1424898 (Pubitemid 34307147)
5. K. J. Chao, S. C. Kao, C. M. Yang, M. S. Hseu, and T. G. Tsai, Electrochem. Solid-State Lett., 3, 489 (2000). 10.1149/1.1391188
6. M. D. Kelzenberg, S. W. Boettcher, J. A. Petykiewicz, D. B. Turner-Evans, M. C. Putnam, E. L. Warren, J. M. Spurgeon, R. M. Briggs, N. S. Lewis, and H. A. Atwater, Nature Mater., 9, 239 (2010). 10.1038/nmat2727
7. K. Q. Peng, X. Wang, X. Wu, and S. T. Lee, Appl. Phys. Lett., 95, 143119 (2009). 10.1063/1.3237174
8. L. Hu and G. Chen, Nano Lett., 7, 3249 (2007). 10.1021/nl071018b (Pubitemid 350216011)
9. J. Schilling, F. Müller, S. Matthias, R. B. Wehrspohn, U. Gösele, and K. Busch, Appl. Phys. Lett., 78, 1180 (2001). 10.1063/1.1351533 (Pubitemid 33662231)
10. P. Bettotti, L. D. Negro, Z. Gaburro, L. Pavesi, A. Lui, M. Galli, M. Patrini, and F. Marabelli, J. Appl. Phys., 92, 6966 (2002). 10.1063/1.1515127
11. B. M. Kayes, H. A. Atwater, and N. S. Lewis, J. Appl. Phys., 97, 114302 (2005). 10.1063/1.1901835 (Pubitemid 40844795)
12. E. C. Garnett and P. Yang, J. Am. Chem. Soc., 130, 9224 (2008). 10.1021/ja8032907 (Pubitemid 352031121)
13. L. Tsakalakos, J. Balch, J. Fronheiser, B. A. Korevaar, O. Sulima, and J. Rand, Appl. Phys. Lett., 91, 233117 (2007). 10.1063/1.2821113 (Pubitemid 350234497)
14. K. E. Plass, M. A. Filler, J. M. Spurgeon, B. M. Kayes, S. Maldonado, B. S. Brunschwig, H. A. Atwater, and N. S. Lewis, Adv. Mater., 21, 325 (2009). 10.1002/adma.200802006
15. H. S. Seo, X. Li, H. D. Um, B. Y. Yoo, J. H. Kim, K. P. Kim, Y. W. Cho, and J. H. Lee, Mater. Lett., 63, 2567 (2009). 10.1016/j.matlet.2009.09.005
16. K. Peng, A. Lu, R. Zhang, and S. T. Lee, Adv. Funct. Mater., 18, 3026 (2008). 10.1002/adfm.200800371
17. K. Peng, J. Hu, Y. Yan, Y. Wu, H. Fang, Y. Xu, S. T. Lee, and J. Zhu, Adv. Funct. Mater., 16, 387 (2006). 10.1002/adfm.200500392 (Pubitemid 43213268)
18. C. Chartier, S. Bastide, and C. Ĺvy-Cĺment, Electrochim. Acta, 53, 5509 (2008). 10.1016/j.electacta.2008.03.009
19. H. Ohji, P. J. French, and K. Tsutsumi, Sens. Actuators, A, 82, 254 (2000). 10.1016/S0924-4247(99)00341-6
20. H. S. Seo, X. Li, H. D. Um, B. Y. Yoo, Y. W. Cho, and J. H. Lee, Electrochem. Solid-State Lett., 12, D89 (2009). 10.1149/1.3231135
21. G. Barillaro, A. Nannini, and M. Piotto, Sens. Actuators, A, 102, 195 (2002). 10.1016/S0924-4247(02)00385-0 (Pubitemid 35422090)
22. K. Kobayashi, F. A. Harraz, S. Izuo, T. Sakka, and Y. H. Ogata, Phys. Status Solidi A, 204, 1321 (2007). 10.1002/pssa.200674325 (Pubitemid 47119984)
23. H. Ohji, P. J. French, S. Izuo, and K. Tsutsumi, Sens. Actuators, A, 85, 390 (2000). 10.1016/S0924-4247(00)00430-1
24. M. H. A. Rifai, M. Christophersen, S. Ottow, J. Carstensen, and H. Föll, J. Electrochem. Soc., 147, 627 (2000). 10.1149/1.1393244 (Pubitemid 30568448)