Macropore growth in a prepatterned p-type silicon wafer

Physica Status Solidi (A) Applications and Materials Science

Volumn 204, Issue 5, 2007, Pages 1321-1326

  Kobayashi, K ^a   Harraz, F A ^b   Izuo, S ^c   Sakka, T ^a   Ogata, Y H ^a  

^a KYOTO UNIVERSITY   (Japan)

^b CENTRAL METALLURGICAL RESEARCH AND DEVELOPMENT INSTITUTE CMRDI   (Egypt)

^c MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ISOTROPIC PORE EXPANSION; MACROPORE GROWTH; RESISTANCE DISTRIBUTION; SILICON SUBSTRATES; WALL THICKNESS;

ANISOTROPIC ETCHING; PORE STRUCTURE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR JUNCTIONS; SUBSTRATES; THICKNESS MEASUREMENT;

SILICON WAFERS;

EID: 34547186726     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200674325     Document Type: Article

References (15)

1. E. K. Propst and P. A. Kohl, J. Electrochem. Soc. 141, 1006 (1994).
2. V. Lehmann and S. Ronnebeck, J. Electrochem. Soc. 146, 2968 (1999).
3. J. Carstensen, M. Christophersen, and H. Föll, Mater. Sci. Eng. B 69/70, 23 (2000).
4. S. Lust and C. Lévy-Clément, J. Electrochem. Soc. 149, C338 (2002).
5. J.-N. Chazalviel, F. Ozanam, N. Gabouze, S. Fellah, and R. B. Wehrspohn, J. Electrochem. Soc. 149, C511 (2002).
6. A. Birner, U. Grüning, S. Ottow, A. Schneider, F. Müller, V. Lehmann, H. Föll, and U. Gösele, phys. stat. sol. (a) 165, 111 (1998).
7. R. Angelucci, A. Poggi, L. Don, G. C. Cardinali, A. Parisini, A. Tagliani, M. Mariasaldi, and F. Cavani, Sens. Actuators A 74, 95 (1999).
8. F. A. Harraz, K. Kamada, J. Sasano, S. Izuo, T. Sakka, and Y. H. Ogata, phys. stat. sol. (a) 202, 1683 (2005).
9. K. Kobayashi, F. A. Harraz, S. Izuo, T. Sakka, and Y. H. Ogata, J. Electrochem. Soc. 153, C218 (2006).
10. A. Vyatkin, V. Starkov, V. Tzeitlin, H. Presting, J. Konle, and U. König, J. Electrochem. Soc. 149, G70 (2002).
11. D. Hamm, T. Sakka, and Y. H. Ogata, Electrochemistry 71, 853 (2003).
12. D. Hamm, J. Sasano, T. Sakka, and Y. H. Ogata, J. Electrochem. Soc. 149, C331 (2002).
13. V. Lehmann, Electrochemistry of Silicon (Wiley-VCH, Weinheim, 2002).
14. F. A. Harraz, K. Kamada, K. Kobayashi, T. Sakka, and Y. H. Ogata, J. Electrochem. Soc. 152, C213 (2005).
15. M. I. J. Beale, J. D. Benjamin, M. J. Uren, N. G. Chew, and A. G. Cullis, J. Cryst. Growth 73, 622 (1985).