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Volumn 110, Issue 12, 2011, Pages

Ultraviolet assisted processing: A unique approach to mitigate oxygen vacancies and attain low loss highly tunable Ba 0.60Sr 0.40TiO 3 thin films

(6) Cole, M W a Toonen, R C a Ivill, M a Hirsch, S G a Ngo, E a Hubbard, C a

a U S ARMY RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TIME; ASSISTED PROCESSING; BST FILM; CHARACTERIZATION TECHNIQUES; CONVENTIONAL FURNACE ANNEALING; CURRENT CHARACTERISTIC; EXPOSURE-TIME; INSULATION PROPERTY; LOW LOSS; MAGNITUDE REDUCTION; MATERIAL PROPERTY; MECHANISTIC MODELS; METALORGANIC SOLUTION DEPOSITIONS; TIO; TUNABILITIES; ULTRAVIOLET ANNEALING;

ANNEALING; BARIUM; LEAKAGE CURRENTS; MATERIALS PROPERTIES; OXYGEN; THIN FILMS; VAPOR DEPOSITION;

OXYGEN VACANCIES;

EID: 84855306512 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3671642 Document Type: Article

Times cited : (19)

References (49)

1
- 77954776296
- 10.1109/TUFFC.2010.1599
- G. Subramanyam, M. Patterson, K. Leedy, R. Neidhard, C. Varanasi, C. Zhang, and G. Steinhauer, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 57, 1692 (2010). 10.1109/TUFFC.2010.1599
- (2010) IEEE Trans. Ultrason. Ferroelectr. Freq. Control , vol.57 , pp. 1692
- Subramanyam, G.¹ Patterson, M.² Leedy, K.³ Neidhard, R.⁴ Varanasi, C.⁵ Zhang, C.⁶ Steinhauer, G.⁷

2
- 10844289594
- High tunability barium strontium titanate thin films for rf circuit applications
- DOI 10.1063/1.1818724
- K. Pervez, P. J. Hansen, and R. A. York, Appl. Phys. Lett. 85, 4451 (2004). 10.1063/1.1818724 (Pubitemid 40001543)
- (2004) Applied Physics Letters , vol.85 , Issue.19 , pp. 4451-4453
- Pervez, N.K.¹ Hansen, P.J.² York, R.A.³

3
- 80051693406
- 10.1080/10584587.2011.574978
- T. S. Kalkur, N. Sbrockey, G. S. Tompa, and M. W. Cole, Integr. Ferroelectr. 126, 28 (2011). 10.1080/10584587.2011.574978
- (2011) Integr. Ferroelectr. , vol.126 , pp. 28
- Kalkur, T.S.¹ Sbrockey, N.² Tompa, G.S.³ Cole, M.W.⁴

4
- 34548039740
- The fabrication and material properties of compositionally multilayered Ba1-x Srx Ti O3 thin films for realization of temperature insensitive tunable phase shifter devices
- DOI 10.1063/1.2761849
- M. W. Cole, E. Ngo, S. Hirsch, J. D. Demaree, S. Zhong, and S. P. Alpay, J. Appl. Phys. 102, 034104 (2007). 10.1063/1.2761849 (Pubitemid 47283469)
- (2007) Journal of Applied Physics , vol.102 , Issue.3 , pp. 034104
- Cole, M.W.¹ Ngo, E.² Hirsch, S.³ Demaree, J.D.⁴ Zhong, S.⁵ Alpay, S.P.⁶

5
- 68949185069
- 10.1080/10584580802540280
- C. V. Weiss, M. W. Cole, S. P. Alpay, E. Ngo, R. C. Toonen, S. G. Hirsch, J. D. Demaree, and C. Hubbard, Integr. Ferroelectr. 100, 36 (2008). 10.1080/10584580802540280
- (2008) Integr. Ferroelectr. , vol.100 , pp. 36
- Weiss, C.V.¹ Cole, M.W.² Alpay, S.P.³ Ngo, E.⁴ Toonen, R.C.⁵ Hirsch, S.G.⁶ Demaree, J.D.⁷ Hubbard, C.⁸

6
- 33847304610
- Preparation and characterization of hafnium doped barium titanate ceramics
- DOI 10.1016/j.jallcom.2006.05.037, PII S0925838806005524
- H. Tian, Y. Wang, J. Miao, H. Chan, and C. Choy, J. Alloys Compd. 431, 197 (2007). 10.1016/j.jallcom.2006.05.037 (Pubitemid 46329971)
- (2007) Journal of Alloys and Compounds , vol.431 , Issue.1-2 , pp. 197-202
- Tian, H.Y.¹ Wang, Y.² Miao, J.³ Chan, H.L.W.⁴ Choy, C.L.⁵

7
- 84855312710
- 10.1080/10584581003591023
- M. W. Cole, R. C. Toonen, S. G. Hirsch, E. Ngo, R. R. Romanofsky, F. V. Keuls, C. Hubbard, M. Ivill, and D. Demaree, Integr. Ferroelectr. 111, 68 (2009). 10.1080/10584581003591023
- (2009) Integr. Ferroelectr. , vol.111 , pp. 68
- Cole, M.W.¹ Toonen, R.C.² Hirsch, S.G.³ Ngo, E.⁴ Romanofsky, R.R.⁵ Keuls, F.V.⁶ Hubbard, C.⁷ Ivill, M.⁸ Demaree, D.⁹

8
- 77649181347
- 10.1016/j.jallcom.2009.11.061
- J. Chen, Y. Tseng, and C. Huang, J. Alloys Compd. 494, 205 (2010). 10.1016/j.jallcom.2009.11.061
- (2010) J. Alloys Compd. , vol.494 , pp. 205
- Chen, J.¹ Tseng, Y.² Huang, C.³

9
- 67649243779
- 10.1016/j.jallcom.2009.03.081
- F. Boujelben, F. Bahri, C. Bouday, A. Maalej, H. Khemakhem, A. Simon, and M. Maglione, J. Alloys Compd. 481, 551 (2009). 10.1016/j.jallcom.2009.03.081
- (2009) J. Alloys Compd. , vol.481 , pp. 551
- Boujelben, F.¹ Bahri, F.² Bouday, C.³ Maalej, A.⁴ Khemakhem, H.⁵ Simon, A.⁶ Maglione, M.⁷

10
- 43849091640
- 10.1016/j.physleta.2008.04.001
- Z. Hu, Y. Li, M. Zhu, Z. Zhu, and J. Chu, Phys. Lett. A 372, 4521 (2008). 10.1016/j.physleta.2008.04.001
- (2008) Phys. Lett. A , vol.372 , pp. 4521
- Hu, Z.¹ Li, Y.² Zhu, M.³ Zhu, Z.⁴ Chu, J.⁵

11
- 0036066075
- B. Ackiel, T. R. Taylor, P. J. Hansen, J. S. Speck, and R. A. York, IEEE MTT-S Int. Microwave Symp. Dig. 3, 1467 (2002).
- (2002) IEEE MTT-S Int. Microwave Symp. Dig. , vol.3 , pp. 1467
- Ackiel, B.¹ Taylor, T.R.² Hansen, P.J.³ Speck, J.S.⁴ York, R.A.⁵

12
- 2642577449
- 10.1016/j.mechmat.2003.04.001
- M. W. Cole and R. G. Geyer, Mech. Mater. 36, 1017 (2004). 10.1016/j.mechmat.2003.04.001
- (2004) Mech. Mater. , vol.36 , pp. 1017
- Cole, M.W.¹ Geyer, R.G.²

13
- 49649104786
- 10.1111/j.1551-2916.2008.02556.x
- D. G. Schlom, L. Q. Chen, X. Q. Pan, A Schmehl, M. A. Zurbuchen, J. Am. Ceram. Soc. 91, 2429 (2008). 10.1111/j.1551-2916.2008.02556.x
- (2008) J. Am. Ceram. Soc. , vol.91 , pp. 2429
- Schlom, D.G.¹ Chen, L.Q.² Pan, X.Q.³ Schmehl, A.⁴ Zurbuchen, M.A.⁵

14
- 21044436445
- 3 films
- DOI 10.1088/0022-3727/38/13/025, PII S002237270592545X
- S. Y. Wang, B. L. Cheng, C. Wang, S. A. T. Redfern, S. Y. Dai, K. J. Jin, H. B. Lu, Y. L. Zhou, Z. H. Chen, and G. Z. Yang, J. Phys. D: Appl. Phys. 38, 2253 (2005). 10.1088/0022-3727/38/13/025 (Pubitemid 40872112)
- (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.13 , pp. 2253-2257
- Wang, S.Y.¹ Cheng, B.L.² Wang, C.³ Redfern, S.A.T.⁴ Dai, S.Y.⁵ Jin, K.J.⁶ Lu, H.B.⁷ Zhou, Y.L.⁸ Chen, Z.H.⁹ Yang, G.Z.¹⁰

15
- 0036678679
- 3 thin films for tunable microwave applications
- DOI 10.1063/1.1491996
- W. Chang, S. W. Kirchoefer, J. M. Pond, J. S. Horwitz, and L. Sengupta, J. Appl. Phys. 92, 1528 (2002). 10.1063/1.1491996 (Pubitemid 34924387)
- (2002) Journal of Applied Physics , vol.92 , Issue.3 , pp. 1528
- Chang, W.¹ Kirchoefer, S.W.² Pond, J.M.³ Horwitz, J.S.⁴ Sengupta, L.⁵

16
- 23844531562
- 3 -based active thin films with silicon-compatible materials and process science protocols to enable affordable on-the-move communications technologies
- DOI 10.1063/1.1977201, 024507
- M. W. Cole, W. D. Nothwang, J. D. Demaree, and S. Hirsch, J. Appl. Phys. 98, 024507 (2005). 10.1063/1.1977201 (Pubitemid 41144589)
- (2005) Journal of Applied Physics , vol.98 , Issue.2 , pp. 1-6
- Cole, M.W.¹ Nothwang, W.D.² Demaree, J.D.³ Hirsch, S.⁴

17
- 79955762330
- 10.1016/j.jallcom.2011.02.074
- R. Reshmia, A. S. Asha, P. S. Krishnaprasad, M. K. Jayaraj, and M. T. Sebastian, J. Alloys Compd. 509, 6561 (2011). 10.1016/j.jallcom.2011.02.074
- (2011) J. Alloys Compd. , vol.509 , pp. 6561
- Reshmia, R.¹ Asha, A.S.² Krishnaprasad, P.S.³ Jayaraj, M.K.⁴ Sebastian, M.T.⁵

18
- 0242335952
- 10.1063/1.1619213
- A. Vorobiev, P. Rundqvist, K. Khamchane, and S. Gevorgian, Appl. Phys. Lett. 83, 3144 (2003). 10.1063/1.1619213
- (2003) Appl. Phys. Lett. , vol.83 , pp. 3144
- Vorobiev, A.¹ Rundqvist, P.² Khamchane, K.³ Gevorgian, S.⁴

19
- 78650298410
- 10.1016/j.apsusc.2010.09.076
- J. Singh and S. B. Krupanidhibref, Appl. Surf. Sci. 257, 2214 (2011). 10.1016/j.apsusc.2010.09.076
- (2011) Appl. Surf. Sci. , vol.257 , pp. 2214
- Singh, J.¹ Krupanidhibref, S.B.²

20
- 0142026444
- 10.1063/1.1613036
- J. W. Lu and S. Stemmer, Appl. Phys. Lett. 83, 2411 (2003). 10.1063/1.1613036
- (2003) Appl. Phys. Lett. , vol.83 , pp. 2411
- Lu, J.W.¹ Stemmer, S.²

21
- 21444434406
- Microwave dielectric properties of tunable capacitors employing bismuth zinc niobate thin films
- DOI 10.1063/1.1883306, 084110
- J. Park, J.W. Lu, S. Stemmer, and R. A. York, J. Appl. Phys. 97, 084110 (2005). 10.1063/1.1883306 (Pubitemid 40914250)
- (2005) Journal of Applied Physics , vol.97 , Issue.8 , pp. 1-4
- Park, J.¹ Lu, J.² Stemmer, S.³ York, R.A.⁴

22
- 0032659909
- 10.1088/0022-3727/32/17/301
- M. S. Tsai and T. Y. Tseng, J. Phys. D: Appl. Phys. 32, 2141 (1999). 10.1088/0022-3727/32/17/301
- (1999) J. Phys. D: Appl. Phys. , vol.32 , pp. 2141
- Tsai, M.S.¹ Tseng, T.Y.²

23
- 79956056807
- 3 thin films under pressure up to 23 GPa
- DOI 10.1063/1.1459484
- M. Shen, Z. Dong, Z. Gan, S. Ge, and W. Cao, Appl. Phys. Lett. 80, 2338 (2002). 10.1063/1.1459484 (Pubitemid 34435258)
- (2002) Applied Physics Letters , vol.80 , Issue.13 , pp. 2338
- Le Marrec, F.¹ Demuer, A.² Jaccard, D.³ Triscone, J.-M.⁴ Lee, M.K.⁵ Eom, C.B.⁶

24
- 79957789323
- 10.4028/www.scientific.net/AMR.239-242.1002
- K.-H. Chen, C.-L. Wu, J.-Y. Lin, and C.-M. Cheng, Adv. Mater. Res. 239-242, 1002 (2011). 10.4028/www.scientific.net/AMR.239-242.1002
- (2011) Adv. Mater. Res. , vol.239-242 , pp. 1002
- Chen, K.-H.¹ Wu, C.-L.² Lin, J.-Y.³ Cheng, C.-M.⁴

25
- 77958536410
- 10.1149/1.3261837
- K. F. Chiu, C. C. Chen, M. H. Chiang, and W. H. Ho, J. Electrochem. Soc. 157, A130 (2010). 10.1149/1.3261837
- (2010) J. Electrochem. Soc. , vol.157 , pp. 130
- Chiu, K.F.¹ Chen, C.C.² Chiang, M.H.³ Ho, W.H.⁴

26
- 1842484069
- 10.1023/B:JECR.0000015661.81386.e6
- A. K. Tagantsev, V. O. Sherman, K. F. Astafiev, J. Venkatesh, and N. Setter, J. Electroceram. 11, 5 (2003). 10.1023/B:JECR.0000015661.81386.e6
- (2003) J. Electroceram. , vol.11 , pp. 5
- Tagantsev, A.K.¹ Sherman, V.O.² Astafiev, K.F.³ Venkatesh, J.⁴ Setter, N.⁵

27
- 0036683552
- 3 substrates for microwave applications
- DOI 10.1016/S0921-4534(02)00826-2, PII S0921453402008262
- Y. Lemaitre, B. Marcilhac, D. Mansart, J. Siejka, and J. C. Mage, Physica C 372, 667 (2002). 10.1016/S0921-4534(02)00826-2 (Pubitemid 34867775)
- (2002) Physica C: Superconductivity and its Applications , vol.372-376 , Issue.PART 2 , pp. 667-670
- Lemaitre, Y.¹ Marcilhac, B.² Mansart, D.³ Siejka, J.⁴ Mage, J.-C.⁵

28
- 0001724690
- 10.1063/1.372031
- O. G. Vendik and L. T. Ter-Martirosyan, J. Appl. Phys. 87, 1435 (2000). 10.1063/1.372031
- (2000) J. Appl. Phys. , vol.87 , pp. 1435
- Vendik, O.G.¹ Ter-Martirosyan, L.T.²

29
- 0001228144
- Improved low frequency and microwave dielectric response in strontium titanate thin films grown by pulsed laser ablation
- DOI 10.1063/1.120799, PII S000369519802004X
- M. J. Dalberth, R. E. Stauber, J. C. Price, C. T. Rogers, and D. Galt, Appl. Phys. Lett. 72, 507 (1998). 10.1063/1.120799 (Pubitemid 128672360)
- (1998) Applied Physics Letters , vol.72 , Issue.4 , pp. 507-509
- Dalberth, M.J.¹ Stauber, R.E.² Price, J.C.³ Rogers, C.T.⁴ Galt, D.⁵

30
- 0242367987
- 10.1007/s11664-003-0098-y
- X. Zhu, J. Zhu, S. Zhou, Z. Liu, N. Ming, S. Lu, H. L.-W. Chan, and C.-L. Choy, J. Electron. Mater. 32, 1125 (2003). 10.1007/s11664-003-0098-y
- (2003) J. Electron. Mater. , vol.32 , pp. 1125
- Zhu, X.¹ Zhu, J.² Zhou, S.³ Liu, Z.⁴ Ming, N.⁵ Lu, S.⁶ Chan, H.L.-W.⁷ Choy, C.-L.⁸

31
- 0942301925
- Processing and properties of BST thin films for tunable microwave devices
- DOI 10.1016/S0955-2219(03)00485-0
- J. Xu, W. Menesklou, and E. Ivers-Tiffee, J. Euro. Ceram. Soc. 24, 1735 (2004). 10.1016/S0955-2219(03)00485-0 (Pubitemid 38135977)
- (2004) Journal of the European Ceramic Society , vol.24 , Issue.6 , pp. 1735-1739
- Xu, J.¹ Menesklou, W.² Ivers-Tiffee, E.³

32
- 0031624237
- 10.1146/annurev.matsci.28.1.463
- S. Aggarwal and R. Ramesh, Annu. Rev. Mater. Sci. 28, 463 (1998). 10.1146/annurev.matsci.28.1.463
- (1998) Annu. Rev. Mater. Sci. , vol.28 , pp. 463
- Aggarwal, S.¹ Ramesh, R.²

33
- 33748849243
- Interface-induced phenomena in polarization response of ferroelectric thin films
- DOI 10.1063/1.2337009
- A. K. Tagantsev and G. Gerra, J. Appl. Phys. 100, 051607 (2006). 10.1063/1.2337009 (Pubitemid 44422009)
- (2006) Journal of Applied Physics , vol.100 , Issue.5 , pp. 051607
- Tagantsev, A.K.¹ Gerra, G.²

34
- 77955916586
- 10.1063/1.3457348
- I. B. Misirlioglu, M. B. Okatan, and S. P. Alpay, J. Appl. Phys. 108, 034105 (2010). 10.1063/1.3457348
- (2010) J. Appl. Phys. , vol.108 , pp. 034105
- Misirlioglu, I.B.¹ Okatan, M.B.² Alpay, S.P.³

35
- 33845748695
- Space charge effects in ferroelectric thin films
- DOI 10.1063/1.2382459
- P. Zubko, D. J. Jung, and J. F. Scott, J. Appl. Phys. 100, 114112 (2006). 10.1063/1.2382459 (Pubitemid 46012220)
- (2006) Journal of Applied Physics , vol.100 , Issue.11 , pp. 114112
- Zubko, P.¹ Jung, D.J.² Scott, J.F.³

36
- 71149087171
- 10.1080/10584580601086865
- S. R. Shannigrahi, K. Yao, S. C. P. Ng, and F. E. H. Tay, Integr. Ferroelectr. 84, 211 (2006). 10.1080/10584580601086865
- (2006) Integr. Ferroelectr. , vol.84 , pp. 211
- Shannigrahi, S.R.¹ Yao, K.² Ng, S.C.P.³ Tay, F.E.H.⁴

37
- 0033204659
- Ultraviolet annealing of tantalum oxide films grown by photo-induced chemical vapour deposition
- DOI 10.1088/0022-3727/32/19/101
- J.-Y. Zhang, I. W. Boyd, V. Dusastre and D. E. Williams, J. Phys. D: Appl. Phys. 32, L91 (1999). 10.1088/0022-3727/32/19/101 (Pubitemid 32078657)
- (1999) Journal of Physics D: Applied Physics , vol.32 , Issue.19
- Zhang, J.-Y.¹ Boyd, I.W.² Dusastre, V.³ Williams, D.E.⁴

38
- 0033875793
- Ultraviolet annealing of thin films grown by pulsed laser deposition
- DOI 10.1016/S0169-4332(99)00406-7
- J.-Y. Zhang and I. W. Boyd, Appl. Surf. Sci. 154-155, 17 (2000). 10.1016/S0169-4332(99)00406-7 (Pubitemid 30573203)
- (2000) Applied Surface Science , vol.154 , pp. 17-21
- Zhang, J.-Y.¹ Boyd, I.W.²

39
- 0032683899
- 10.1149/1.1390866
- V. Craciun and R. K. Singh, Electrochem Solid State Lett. 2, 446 (1999). 10.1149/1.1390866
- (1999) Electrochem Solid State Lett. , vol.2 , pp. 446
- Craciun, V.¹ Singh, R.K.²

40
- 0001347604
- 10.1063/1.126216
- V. Craciun and R. K. Singh, Appl Phys Lett. 76, 1932 (2000). 10.1063/1.126216
- (2000) Appl Phys Lett. , vol.76 , pp. 1932
- Craciun, V.¹ Singh, R.K.²

41
- 67649256052
- 10.1016/j.pmatsci.2009.04.003
- M. Tsuchiya, S. K. R. S. Sankaranarayanan, and S. Ramanathan, Prog. Mater. Sci. 54, 981 (2009). 10.1016/j.pmatsci.2009.04.003
- (2009) Prog. Mater. Sci. , vol.54 , pp. 981
- Tsuchiya, M.¹ Sankaranarayanan, S.K.R.S.² Ramanathan, S.³

42
- 14644413558
- 2 thin films
- DOI 10.1016/j.microrel.2004.11.017, PII S0026271404004937, 13th Workshop on Dielectrics in Microelectronics
- Q. Fang, I. Liaw, M. Modreanu, P. K. Hurley, and I. W. Boyd, Microelectron. Reliab. 45, 957 (2005). 10.1016/j.microrel.2004.11.017 (Pubitemid 40309074)
- (2005) Microelectronics Reliability , vol.45 , Issue.5-6 , pp. 957-960
- Fang, Q.¹ Liaw, I.² Modreanu, M.³ Hurley, P.K.⁴ Boyd, I.W.⁵

43
- 8344253657
- 10.1002/adma.v16:18
- M. L. Calzada, I. Bretos, R. Jimenez, H. Guillon, and L. Pardo, Adv. Mater. 16, 1620 (2004). 10.1002/adma.v16:18
- (2004) Adv. Mater. , vol.16 , pp. 1620
- Calzada, M.L.¹ Bretos, I.² Jimenez, R.³ Guillon, H.⁴ Pardo, L.⁵

44
- 0036639288
- 3 thin films for tunable microwave device applications
- DOI 10.1063/1.1484231
- M. W. Cole, C. Hubbard, E. Ngo, M. Ervin, M. Wood, and R. G. Geyer, J. Appl. Phys. 92, 475 (2002). 10.1063/1.1484231 (Pubitemid 34783341)
- (2002) Journal of Applied Physics , vol.92 , Issue.1 , pp. 475
- Cole, M.W.¹ Hubbard, C.² Ngo, E.³ Ervin, M.⁴ Wood, M.⁵ Geyer, R.G.⁶

45
- 0000541018
- 10.1063/1.125977
- W. J. Kim, W. Chang, S. B. Qadri, J. M. Pond, S. W. Kirchoefer, D. B. Chrisey, and J. S. Horwitz, Appl. Phys. Lett. 76, 1185 (2000). 10.1063/1.125977
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1185
- Kim, W.J.¹ Chang, W.² Qadri, S.B.³ Pond, J.M.⁴ Kirchoefer, S.W.⁵ Chrisey, D.B.⁶ Horwitz, J.S.⁷

46
- 77952986237
- 10.1063/1.3430570
- H. Ren, S. L. Cheng, Y. Nishi, and J. L. Shohet, Appl. Phys. Lett. 96, 192904 (2010). 10.1063/1.3430570
- (2010) Appl. Phys. Lett. , vol.96 , pp. 192904
- Ren, H.¹ Cheng, S.L.² Nishi, Y.³ Shohet, J.L.⁴

47
- 0000099649
- 10.1063/1.125215
- A. Srivastava, V. Craciun, J. M. Howard, and R. K. Singh, Appl. Phys. Lett. 75, 3002 (1999). 10.1063/1.125215
- (1999) Appl. Phys. Lett. , vol.75 , pp. 3002
- Srivastava, A.¹ Craciun, V.² Howard, J.M.³ Singh, R.K.⁴

48
- 0034204819
- 10.1023/A:1009974929096
- J. S. Horwitz, W. Chang, W. Kim, S. B. Qadri, J. M. Pond, S. W. Kirchoefer, and D. B. Chrisey, J. Electroceram. 4, 357 (2000). 10.1023/A:1009974929096
- (2000) J. Electroceram. , vol.4 , pp. 357
- Horwitz, J.S.¹ Chang, W.² Kim, W.³ Qadri, S.B.⁴ Pond, J.M.⁵ Kirchoefer, S.W.⁶ Chrisey, D.B.⁷

49
- 68949191026
- 10.1007/s10853-009-3664-8
- Y. Lin and C. L. Chen, J. Mater. Sci. 44, 5274 (2009). 10.1007/s10853-009-3664-8
- (2009) J. Mater. Sci. , vol.44 , pp. 5274
- Lin, Y.¹ Chen, C.L.²

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