Ba 0.60Sr 0.40TiO 3 thin films for microwave phase shifter devices: The influence of crystallization temperature on the electric field dependent phase shift response

Integrated Ferroelectrics

Volumn 111, Issue 1, 2009, Pages 68-79

  Cole, M W ^a   Toonen, R C ^a   Hirsch, S G ^a   Ngo, E ^a   Romanofsky, R R ^b   Van Keuls, Fred ^c   Hubbard, C ^a   Ivill, M ^a   Demaree, D ^a  

^a U S ARMY RESEARCH LABORATORY   (United States)

^b NASA GLENN RESEARCH CENTER   (United States)

^c OHIO AEROSPACE INSTITUTE   (United States)

Author keywords

BST; Microwave devices; Phase shifter; Thin film processing

Indexed keywords

ATOMIC FORCE MICROSCOPIES (AFM); BST; CRYSTALLIZATION TEMPERATURE; FILM FABRICATION; FREQUENCY RANGES; GLANCING ANGLE X-RAY DIFFRACTIONS; METALORGANIC SOLUTION; MICROWAVE PHASE SHIFTERS; MICROWAVE SIGNALS; PHASE SHIFT MEASUREMENT; RELATIVE PHASE; SAPPHIRE SUBSTRATES; TEST CIRCUIT; THIN FILM PROCESSING; TIO;

ATOMIC FORCE MICROSCOPY; BARIUM STRONTIUM TITANATE; COPLANAR WAVEGUIDES; CRYSTALLOGRAPHY; DIELECTRIC MATERIALS; ELECTRIC FIELDS; FERROELECTRICITY; MICROSTRUCTURE; MICROWAVE DEVICES; ORGANOMETALLICS; PHASE SHIFT; PHASE SHIFTERS; PIEZOELECTRIC DEVICES; PIEZOELECTRICITY; SAPPHIRE; THIN FILMS; X RAY DIFFRACTION;

VAPOR DEPOSITION;

EID: 84855312710     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584581003591023     Document Type: Conference Paper

References (20)

1. A. K. Tagantsev, V. O. Sherman, K. F. Astafiev, J.Venkatesh, and N. Setter, J. Electroceram. 11, 5 (2003).
2. O. G. Vendik, E. K. Hollmann, A. B. Kozyrev, and A. M. Prudan, J. Supercond. 12, 325 (1999).
3. M. W. Cole, C. Hubbard, E. Ngo, M. Ervin, M. Wood, and R. G. Geyer, J. Appl. Phys. 92, 475 (2002).
4. P. C. Joshi and M. W. Cole, Appl. Phys. Lett. 77, 289 (2000).
5. N. K. Pervez, P. J. Hansen, and R. A. York, Appl. Phys. Lett. 85, 4451 (2004).
6. S. Zhong, S. P. Alpay, M. W. Cole, E. Ngo, S. Hirsch, and J. D. Demaree, Appl. Phys. Lett. 90, 092901 (2007).
7. A. S. Nagra and R.A. York, IEEE Trans.Microwave Theory Tech. 49, 1705 (1999).
8. M. W. Cole, P. C. Joshi, M. H. Ervin, M. C. Wood, and R. L. Pfeffer, Thin Solid Films 374, 34 (2000).
9. M. W. Cole, E. Ngo, S. Hirsch, J. D. Demaree, S. Zhong and S. P. Alpay, J. Appl. Phys. 102, 034104 (2007).
10. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 15, 227 (1986).
11. Adrian Podpirka, M.W. Cole, and Shriram Ramanathan, Appl. Phys. Lett. 92, 212906 (2008).
12. J. S. Horwitz,W. Chang, A. C. Carter, J. M. Pond, S.W. Kirchoefer, D. B. Chrisey, J. Levy, and C. Hubert, Integr. Ferroelectr. 22, 279 (1998).
13. K.-J. Hong, Y.-K. Min, and J.-C. Cho, IEEE Internat. Trans. Electrophys. Applic. 12C, 47 (2002).
14. H. C. Ryu, S. E. Moon, Y. T. Kim, M. H. Kwak, S. J. Lee, K. Y. Kang, and S. O. Park, Jour. Korean Phys. Soc. 48, 1637 (2006).
15. S. S. Gevorgian, T. Martinsson, P. L. J. Linner, and E. L. Kollberg, IEEE Trans. Microwave Theory Tech. 44, 896 (1996).
16. E. K. Kim, S. E. Moon, S. J. Lee, S. K. Han, K. Y. Kang and W. J. Kim, Ferroelectrics 272, 237 (2002).
17. S. E. Moon, E. K. Kim, S. J. Lee, M. H. Kwak, Y. T. Kim, H. C. Ryu, K. Y. Kang, S. K. Han andW. J. Kim, J. Korean Phys. Soc. 42, S1350 (2003).
18. F. W. Van Keuls, C. T. Chevalier, F. A. Miranda, C. M. Carlson, T. V. Rivkin, P. A. Perkins, and D. S. Ginley, Microwave Opt. Tech. Lett. 29, 34 (2001).
19. C. L. Tien, C. C. Jaing, C. Lee, K. P. Chuang, J. Mod. Opt. 47, 1681 (2002).
20. M.W. Cole,W. D. Nothwang, J. D. Demaree, and S. Hirsch, J. Appl. Phys. 98, 024507 (2005).