Photon-assisted oxidation and oxide thin film synthesis: A review

Progress in Materials Science

Volumn 54, Issue 7, 2009, Pages 981-1057

  Tsuchiya, Masaru ^a   Sankaranarayanan, Subramanian K R S ^a   Ramanathan, Shriram ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; FILM GROWTH; FLUORSPAR; OXIDE MINERALS; PEROVSKITE; PHOTONS; TITANIUM DIOXIDE;

ATOMIC LEVEL CONTROL; NEAR ROOM TEMPERATURE; OXIDATION AND OXIDES; OXYGEN INCORPORATION; OXYGEN NON-STOICHIOMETRIES; POST DEPOSITION ANNEALING; PROCESSING APPROACH; REPRESENTATIVE OXIDE;

OXIDE FILMS;

EID: 67649256052     PISSN: 00796425     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.pmatsci.2009.04.003     Document Type: Review

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