Ultraviolet annealing of tantalum oxide films grown by photo-induced chemical vapour deposition

Journal of Physics D: Applied Physics

Volumn 32, Issue 19, 1999, Pages

  Zhang, Jun Ying ^a   Boyd, Ian W ^a   Dusastre, Vincent ^a   Williams, David E ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; FILM GROWTH; HIGH TEMPERATURE EFFECTS; LEAKAGE CURRENTS; PERMITTIVITY; PHOTOCHEMICAL REACTIONS; SILICA; TANTALUM COMPOUNDS; THIN FILMS; ULTRAVIOLET RADIATION;

TANTALUM PENTOXIDE;

DIELECTRIC FILMS;

EID: 0033204659     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/19/101     Document Type: Article

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