Alkyl and alkoxyl monolayers directly attached to silicon: Chemical durability in aqueous solutions

Langmuir

Volumn 25, Issue 10, 2009, Pages 5516-5525

  Sano, Hikaru ^a   Maeda, Hajime ^a   Ichii, Takashi ^a   Murase, Kuniaki ^a   Noda, Kei ^a   Matsushige, Kazumi ^a   Sugimura, Hiroyuki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

1-DODECANOL; 1-HEXADECENE; ALKOXYL; AQUEOUS SOLUTIONS; BASIC SOLUTIONS; CHEMICAL BONDINGS; CHEMICAL DURABILITY; DEGRADATION BEHAVIOR; DODECANAL; FILM DENSITY; GRAZING INCIDENCE X-RAY REFLECTIVITIES; HEXADECANOL; HYDROGEN-TERMINATED SI(111); LINEAR MOLECULES; NATIVE OXIDE LAYER; SAMS; SI (1 1 1); SILICON (111) SURFACE; SURFACE-ROUGHENING; TERRACE STRUCTURE; THERMALLY ACTIVATED;

ACOUSTIC MICROSCOPES; ATOMIC FORCE MICROSCOPY; DEGRADATION; DURABILITY; GRAFTING (CHEMICAL); HYDROGEN; HYDROGEN BONDS; PHOTODEGRADATION; SELF ASSEMBLED MONOLAYERS; SILICON; SODIUM; SOIL CONSERVATION; SYNTHESIS (CHEMICAL);

CRYSTAL ATOMIC STRUCTURE;

EID: 66249113887     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la804080g     Document Type: Article

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