Infrared and X-ray photoelectron spectroscopic studies of the reactions of hydrogen-terminated crystalline Si(111) and Si(100) surfaces with Br2, I2, and ferrocenium in alcohol solvents

Journal of Physical Chemistry B

Volumn 106, Issue 14, 2002, Pages 3639-3656

  Haber, Joel A ^a,b   Lewis, Nathan S ^a  

^a California Institute of Technology   (United States)

^b UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SURFACES;

CHEMICAL BONDS; CRYSTALLINE MATERIALS; INFRARED SPECTROSCOPY; ORGANIC SOLVENTS; OXIDATION; SOLUTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTION KINETICS;

EID: 0037061512     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0102872     Document Type: Article

References (113)

1. Bansal, A.; Li, X.L.; Lauermann, I.; Lewis, N.S.; Yi, S.I.; Weinberg, W.H. J. Am. Chem. Soc. 1996, 118, 7225-7226.
2. Terry, J.; Mo, R.; Wigren, C.; Cao, R.Y.; Mount, G.; Pianetta, P.; Linford, M.R.; Chidsey, C.E.D. Nucl. Instrum. Methods Phys. Res., Sect. B 1997, 133, 94-101.
3. Terry, J.; Linford, M.R.; Wigren, C.; Cao, R.Y.; Pianetta, P.; Chidsey, C.E.D. Appl. Phys. Lett. 1997, 71, 1056-1058.
4. Terry, J.; Linford, M.R.; Wigren, C.; Cao, R.Y.; Pianetta, P.; Chidsey, C.E.D. J. Appl. Phys. 1999, 85, 213-221.
5. He, J.; Patitsas, S.N.; Preston, K.F.; Wolkow, R.A.; Wayner, D.D.M. Chem. Phys. Lett. 1998, 286, 508-514.
6. Boukherroub, R.; Morin, S.; Bensebaa, F.; Wayner, D.D.M. Langmuir 1999, 15, 3831-3835.
7. Boukherroub, R.; Wayner, D.D.M. J. Am. Chem. Soc. 1999, 121, 11513-11515.
8. Effenberger, F.; Gotz, G.; Bidlingmaier, B.; Wezstein, M. Angew. Chem., Int. Ed. 1998, 37, 2462-2464.
9. Cicero, R.L.; Linford, M.R.; Chidsey, C.E.D. Langmuir 2000, 16, 5688-5695.
10. Linford, M.R.; Chidsey, C.E.D. J. Am. Chem. Soc. 1993, 115, 12631-12632.
11. Linford, M.R.; Fenter, P.; Eisenberger, P.M.; Chidsey, C.E.D. J. Am. Chem. Soc. 1995, 117, 3145-3155.
12. Sieval, A.B.; Demirel, A.L.; Nissink, J.W.M.; Linford, M.R.; van der Maas, J.H.; de Jeu, W.H.; Zuilhof, H.; Sudholter, E.J.R. Langmuir 1998, 14, 1759-1768.
13. Sung, M.M.; Kluth, G.J.; Yauw, O.W.; Maboudian, R. Langmuir 1997, 13, 6164-6168.
14. Zazzera, L.A.; Evans, J.F.; Deruelle, M.; Tirrell, M.; Kessel, C.R.; McKeown, P. J. Electrochem. Soc. 1997, 144, 2184-2189.
15. Yu, H.Z.; Boukherroub, R.; Morin, S.; Wayner, D.D.M. Electrochem. Commun. 2000, 2, 562-566.
16. Mitchell, S.A.; Boukherroub, R.; Anderson, S. J. Phys. Chem. B 2000, 104, 7668-7676.
17. Fidelis, A.; Ozanam, F.; Chazalviel, J.N. Surf. Sci. 2000, 444, L7-L10.
18. Gros-Jean, M.; Herino, R.; Chazalviel, J.N.; Ozanam, F.; Lincot, D. Mater. Sci. Eng., B 2000, 69, 77-80.
19. Allongue, P.; de Villeneuve, C.H.; Pinson, J.; Ozanam, F.; Chazalviel, J.N.; Wallart, X. Electrochim. Acta 1998, 43, 2791-2798.
20. Allongue, P.; de Villeneuve, C.H.; Pinson, J. Electrochim. Acta 2000, 45, 3241-3248.
21. Bergerson, W.F.; Mulder, J.A.; Hsung, R.P.; Zhu, X.Y. J. Am. Chem. Soc. 1999, 121, 454-455.
22. Zhu, X.Y.; Mulder, J.A.; Bergerson, W.F. Langmuir 1999, 15, 8147-8154.
23. Zhu, X.Y.; Boiadjiev, V.; Mulder, J.A.; Hsung, R.P.; Major, R.C. Langmuir 2000, 16, 6766-6772.
24. Lee, E.J.; Bitner, T.W.; Ha, J.S.; Shane, M.J.; Sailor, M.J. J. Am. Chem. Soc. 1996, 118, 5375-5382.
25. Boukherroub, R.; Morin, S.; Sharpe, P.; Wayner, D.D.M.; Allongue, P. Langmuir 2000, 16, 7429-7434.
26. Haber, J.A.; Lauermann, I.; Michalak, D.; Vaid, T.P.; Lewis, N.S. J. Phys. Chem. B 2000, 104, 9947-9950.
27. Kim, N.Y.; Laibinis, P.E. J. Am. Chem. Soc. 1997, 119, 2297-2298.
28. Cleland, G.; Horrocks, B.R.; Houlton, A. J. Chem. Soc. Faraday Trans. 1995, 91, 4001-4003.
29. Eagling, R.D.; Bateman, J.E.; Goodwin, N.J.; Henderson, W.; Horrocks, B.R.; Houlton, A. J. Chem. Soc. Dalton Trans. 1998, 1273-1275.
30. Bateman, J.E.; Eagling, R.D.; Horrocks, B.R.; Houlton, A. J. Phys. Chem. B 2000, 104, 5557-5565.
31. Sailor, M.J.; Lee, E. J. Adv. Mater. 1997, 9, 783.
32. Song, J.H.; Sailor, M.J. Comments Inorg. Chem. 1999, 21, 69-84.
33. Buriak, J.M. Chem. Commun. 1999, 1051-1060.
34. Buriak, J.M. Adv. Mater. 1999, 11, 265-267.
35. Wolkow, R.A. Annu. Rev. Phys. Chem. 1999, 50, 413-441.
36. Teplyakov, A.V.; Kong, M.J.; Bent, S.F. J. Am. Chem. Soc. 1997, 119, 11100-11101.
37. Hamers, R.J.; Coulter, S.K.; Ellison, M.D.; Hovis, J.S.; Padowitz, D.F.; Schwartz, M.P.; Greenlief, C.M.; Russell, J.N. Acc. Chem. Res. 2000, 33, 617-624.
38. Lopinski, G.P.; Wayner, D.D.M.; Wolkow, R.A. Nature 2000, 406, 48-51.
39. Bansal, A.; Lewis, N.S. J. Phys. Chem. B 1998, 102, 1067-1070.
40. Bansal, A.; Lewis, N.S. J. Phys. Chem. B 1998, 102, 4058-4060.
41. Reddy, A.J.; Chart, J.V.; Burr, T.A.; Mo, R.; Wade, C.P.; Chidsey, C.E.D.; Michel, J.; Kimerling, L.C. Physica B 1999, 274, 468-472.
42. Reddy, A.J.; Burr, T.A.; Chan, J.K.; Norga, G.J.; Michel, J.; Kimerling, L.C. Silicon surface defects: The roles of passivation and surface contamination. In Defects in Semiconductors, ICDS-19; Davies, G., Nazaré, M.H., Eds.; Trans Tech Publications: Uetikon-Zuerich, Switzerland, 1997; Vol. 258-2, Parts 1-3, pp 1719-1724.
43. Horanyi, T.S.; Pavelka, T.; Tutto, P. Appl. Surf. Sci. 1993, 63, 306-311.
44. Msaad, H.; Michel, J.; Lappe, J.J.; Kimerling, L.C. J. Electron. Mater. 1994, 23, 487-491.
45. Stephens, A.W.; Green, M.A. Sol. Energy Mater. Sol. Cells 1997, 45, 255-265.
46. Kurita, K.; Shingouji, T. Jpn. J. Appl. Phys. 1999, 38, 5710-5714.
47. Larkins, G.L.; Fung, C.D.; Rickert, S.E. Thin Solid Films 1989, 180, 217-225.
48. Chabal, Y.J.; Harris, A.L.; Raghavachari, K.; Tully, J.C. Int. J. Mod. Plays. B 1993, 7, 1031-1078.
49. Jakob, P.; Chabal, Y.J.; Raghavachari, K.; Dumas, P.; Christman, S.B. Surf. Sci. 1993, 285, 251-258.
50. Higashi, G.S.; Chabal, Y.J.; Trucks, G.W.; Raghavachari, K. Appl. Phys. Lett. 1990, 56, 656-658.
51. Wade, C.P.; Chidsey, C.E.D. Appl. Phys. Lett. 1997, 71, 1679-1681.
52. Cowan, P.L.; Golovchenko, J.A.; Robbing, M.F. Phys. Rev. Lett. 1980, 44, 1680-1683.
53. Golovchenko, J.A.; Patel, J.R.; Kaplan, D.R.; Cowan, P.L.; Bedzyk, M.J. Phys. Rev. Lett. 1982, 49, 560-563.
54. Materlik, G.; Frahm, A.; Bedzyk, M.J. Phys. Rev. Lett. 1984, 52, 441-444.
55. Bedzyk, M.J.; Gibson, W.M.; Golovchenko, J.A. J. Vac. Sci. Technol, 1982, 20, 634-637.
56. Dev, B.N.; Aristov, V.; Hertel, N.; Thundat, T.; Gibson, W.M. Surf. Sci. 1985, 163, 457-477.
57. Funke, P.; Materlik, G. Solid Stare Commun. 1985, 54, 921-923.
58. Funke, P.; Materlik, G. Surf Sci. 1987, 188, 378-390.
59. Michel, E.G.; Pauly, T.; Eteläniemi, V.; Materlik, G. Surf. Sci. 1991, 241, 111-123.
60. Stephens, A.W.; Green, M.A. J. Appl. Phys. 1996, 80, 3897-3903.
61. Sekar, K.; Satyam, P.V.; Kuri, G.; Mahapatra, D.P.; Dev, B.N. Nucl. Instrum. Methods Phys. Res., Sect. B 1992, 71,308-313.
62. Sekar, K.; Satyam, P.V.; Kuri, G.; Mahapatra, D.P.; Dev, B.N. Nucl. Instrum. Methods Phys. Res., Sect. B 1993, 73, 63-70.
63. Sekar, K.; Kuri, G.; Satyam, P.V.; Sundaravel, B.; Mahapatra, D.P.; Dev, B. N. Solid State Commun. 1995, 96, 871-875.
64. Sekar, K.; Kuri, G.; Satyam, P.V.; Sundaravel, B.; Mahapatra, D.P.; Dev, B.N. Surf Sci. 1995, 339, 96-104.
65. Sekar, K.; Kuri, G.; Satyam, P.V.; Sundaravel, B.; Mahapatra, D.P.; Dev, B.N. Phys. Rev. B: Condens. Matter Mater. Phys. 1995, 51, 14330-14336.
66. Sundaravel, B.; Das, A.K.; Ghose, S.K.; Sekar, K.; Dev, B.N. Appl. Surf. Sci. 1999, 137, 11-19.
67. Sekar, K.; Sundaravel, B.; Wilson, I.H.; Heiland, W. Appl. Surf Sci. 2000, 156, 161-168.
68. Rout, B.; Sundaravel, B.; Das, A.K.; Ghose, S.K.; Sekar, K.; Mahapatra, D.P.; Dev, B.N. J. Vac. Sci. Technol., B 2000, 18, 1847-1852.
69. Rosenbluth, M.L.; Lewis, N.S. J. Am. Chem. Soc. 1986, 108, 4689-4695.
70. Gibbons, J.F.; Cogan, G.W.; Gronet, C.M.; Lewis, N.S. Appl. Phys. Lett. 1984, 45, 1095-1097.
71. Lewis, N.S. Acc. Chem. Res. 1990, 23, 176-183.
72. Tan, M.X.; Laibinis, P.E.; Nguyen, S.T.; Kesselman, J.M.; Stanton, C.E.; Lewis, N.S. Prog. Inorg. Chem. 1994, 41, 21-144.
73. Rosenbluth, M.L.; Lewis, N.S. J. Electrochem. Soc. 1987, 134, C463-C464.
74. Rosenbluth, M.L.; Lewis, N.S. J. Phys. Chem. 1989, 93, 3735-3740.
75. Fajardo, A.M.; Lewis, N.S. J. Phys. Chem. B 1997, 101, 11136-11151.
76. Chazalviel, J.N. J. Electroanal. Chem. 1987, 233, 37-48.
77. Warntjes, M.; Vieillard, C.; Ozanam, F.; Chazalviel, J.N. J. Electrochem. Soc. 1995, 142, 4138-4142.
78. Briggs, D.; Seah, M.P. Practical Surface Analysis: Auger and X-ray Photoelectron Spectroscopy, 2nd ed.; Wiley: New York, 1990; Vol. 1.
79. Scofield, J.H. J. Electron Spectrosc. Relat. Phenom. 1976, 8, 129.
80. Oxtoby, D.W.; Nachtrieb, N.H.; Freeman, W.A. Chemistry, Science of Change, 2nd ed.; Saunders College Publishing: Philadelphia, PA, 1994.
81. Tufts, B.J.; Kumar, A.; Bansal, A.; Lewis, N.S. J. Phys. Chem. 1992, 96, 4581-4592.
82. Laibinis, P.E.; Bain, C.D.; Whitesides, G.M. J. Phys. Chem. 1991, 95, 7017-7021.
83. Pomykal, K.E.; Fajardo, A.M.; Lewis, N.S. J. Phys. Chem. 1995, 99, 8302-8310.
84. Hochella, M.F.; Carim, A.H. Surf Sci. 1988, 197, L260-L268.
85. McFeely, F.R.; Morar, J.F.; Shinn, N.D.; Landgren, G.; Himpsel, F. J. Phys. Rev. B 1984, 30, 764-770.
86. Himpsel, F.J.; McFeely, F.R.; Talebibrahimi, A.; Yarmoff, J.A.; Hollinger, G. Phys. Rev. B 1988, 38, 6084-6096.
87. Chakarian, V.; Shuh, D.K.; Yarmoff, J.A.; Hakansson, M.C.; Karlsson, U.O. Surf. Sci. 1993, 296, 383-392.
88. Hill, J.M.; Royce, D.G.; Fadley, C.S.; Wagner, L.F.; Grunthaner, F. J. Chem. Phys. Lett. 1976, 44, 225-231.
89. Fadley, F.S. Prog. Solid State Chem. 1976, 11,265-343.
90. Lifshits, V.G.; Saranin, A.A.; Zotov, A.V. Surface Phases on Silicon; John Wiley and Sons: New York, 1994.
91. Sieval, A.B.; van den Hour, B.; Zuilhof, H.; Sudholter, E.J.R. Langmuir 2000, 16, 2987-2990.
92. Fajardo, A.M.; Lewis, N.S. Science 1996, 274, 969-972.
93. Lewis, N.S. J. Phys. Chem. B 1998, 102, 4843-4855.
94. Shimanouchi, T. Tables of Molecular Vibrational Frequencies Consolidated Volume 1; National Bureau of Standards: Washington, DC, 1972; Vol. I.
95. - species. Boron could not be detected by XPS because its cross section is small (0.486 vs 3.40 for F) and because its peak position is superimposed on the 2nd bulk plasmon resonance of the Si 2s peak.
96. Ye, S.; Ichihara, T.; Uosaki, K. Appl. Phys. Lett. 1999, 75, 1562-1564.
97. Green, W.H.; Lee, E.J.; Lauerhaas, J.M.; Bitner, T.W.; Sailor, M. J. Appl. Phys. Lett. 1995, 67, 1468-1470.
98. Chabal, Y.J.; Higashi, G.S.; Raghavachari, K.; Burrows, V.A. J. Vac. Sci. Technol., A 1989, 7, 2104-2109.
99. Robins, E.G.; Stewart, M.P.; Buriak, J.M. Chem. Commun. 1999, 2479-2480.
100. Stewart, M.P.; Buriak, J.M. Angew. Chem., Int. Ed. 1998, 37, 3257-3260.
101. Bateman, J.E.; Horrocks, B.R.; Houlton, A. J. Chem. Soc. Faraday Trans. 1997, 93, 2427-2431.
102. Henderson, R.C.; Polito, W. J. Surf Sci. 1969, 14, 473-477.
103. Cheng, H.S.; Luo, L.; Okamoto, M.; Thundat, T.; Hashimoto, S.; Gibson, W.M. J. Vac. Sci. Technol., A 1987, 5, 607-610.
104. Greenwood, N.N.; Earnshaw, A. Chemistry of the Elements; Pergamon: New York, 1984.
105. Allongue, P.; Costa-Kieling, V.; Gerischer, H. J. Electrochem. Soc. 1993, 140, 1009-1018.
106. Allongue, P.; Costa-Kieling, V.; Gerischer, H. J. Electrochem. Soc. 1993, 140, 1018-1026.
107. Gerischer, H.; Allongue, P.; Costa-Kieling, V. Bet. Bunsen-Ges. Phys. Chem. 1993, 97, 753-756.
108. Allongue, P.; Kieling, V.; Gerischer, H. Electrochim. Acta 1995, 40, 1353-1360.
109. Shreve, G.A.; Karp, C.D.; Pomykal, K.E.; Lewis, N.S. J. Phys. Chem. 1995, 99, 5575-5580.
110. Mao, D.; Kim, K.J.; Frank, A.J. J. Electrochem. Soc. 1994, 141, 1231-1236.
111. Royea, W.J.; Michalak, D.J.; Lewis, N.S. Appl. Phys. Lett. 2000, 77, 2566-2568.
112. Haber, J.A.; Michalak, D.; Lewis, N.S., to be submitted for publication.
113. Royea, W.J.; Juang, A.; Lewis, N.S. Appl. Phys. Lett. 2000, 77, 1988-1990.