Nonionic photoacid generator behavior under high-energy exposure sources

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Lawson, Richard A ^a   Noga, David E ^a   Tolbert, Laren M ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Acid sensitive dyes; Chemically amplified photoresist; Dill C parameter; Electron affinity; Ellipsometry; Ionic photoacid generators; Nonionic photoacid generators; Photoacid generation efficiency; Photoacid generator

Indexed keywords

ELECTRON AFFINITY; ELECTRON BEAMS; ENERGY EFFICIENCY; HIGH ENERGY PHYSICS; PHOTORESISTS; RATE CONSTANTS; SPECTROSCOPIC ELLIPSOMETRY;

C PARAMETER; CHEMICALLY AMPLIFIED PHOTORESIST; NONIONIC; PHOTOACID GENERATORS; PHOTOACIDS;

PHOTORESISTORS;

EID: 80055074188     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3259205     Document Type: Conference Paper

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