Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 302-311

  Jablonski, Erin L ^a   Prabhu, Vivek M ^a   Sambasivan, Sharadha ^a   Fischer, Daniel A ^b   Lin, Eric K ^a   Goldfarb, Dario L ^c   Angelopoulos, Marie ^c   Ito, Hiroshi ^d  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITÉ PARIS EST   (France)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Airborne molecular contaminants; Blend miscibility; NEXAFS

Indexed keywords

AIRBORNE MOLECULAR CONTAMINANTS; BLEND MISCIBILITY; MOLECULAR DIFFUSION;

DIFFUSION; FLUORINE CONTAINING POLYMERS; IMPURITIES; LIGHT ABSORPTION; PHOTODEGRADATION; SURFACE CHEMISTRY; SURFACE TENSION; THIN FILMS;

PHOTORESISTS;

EID: 3843132846     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535703     Document Type: Conference Paper

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