Novel photoacid generators for chemically amplified resists

Journal of Photopolymer Science and Technology

Volumn 16, Issue 3, 2003, Pages 335-345

  Asakura, Toshikage ^a   Yamato, Hitoshi ^a   Matsumoto, Akira ^a   Murer, Peter ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

ArF; DUV; Non ionic; P parameter; PAG

Indexed keywords

2 HEPTANONE; 3 ETHOXYPROPIONIC ACID ETHYL ESTER; ALKANONE; CAMPHOR; ETHER DERIVATIVE; LACTIC ACID ETHYL ESTER; OCTANE; OXIME DERIVATIVE; POLY(4 HYDROXYSTYRENE); PROPANE; PROPIONIC ACID DERIVATIVE; PROPYLENE GLYCOL METHYL ETHER ACETATE; STYRENE DERIVATIVE; SULFONIC ACID DERIVATIVE; TOLUENE DERIVATIVE; TRIFLUOROMETHANESULFONIC ACID; UNCLASSIFIED DRUG;

ARTICLE; SOLUBILITY; THERMOSTABILITY; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROSCOPY; VOLATILIZATION;

EID: 0038168330     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.335     Document Type: Article

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