SCOPUS 정보 검색 플랫폼

Journal of Photopolymer Science and Technology

Volumn 15, Issue 3, 2002, Pages 453-464

Transparency versus efficiency: Important considerations in the design of photoacid generators for ArF lithography

(4) Cameron, James F a Pohlers, Gerd a Suzuki, Yasuhiro a Chan, Nicholas a

Author keywords

Acid generating efficiency; C parameter; Deep UV and 193 nm chemically amplified resists; P parameter; Photoacid generator; Quantum yield

Indexed keywords

ACID; ARGON; FLUORIDE; LACTONE METHACRYLATE; METHACRYLIC ACID DERIVATIVE; METHYL 2 ADAMANTYLMETHACRYLATE; PHENOL DERIVATIVE; PHENYL GROUP; SULFONIUM DERIVATIVE; TRIPHENYLSULFONIUM ION; UNCLASSIFIED DRUG;

ABSORPTION SPECTROPHOTOMETRY; ARTICLE; CHROMATOPHORE; DEVICE; FILM; LIGHT ABSORPTION; LITHOGRAPHY; QUANTUM YIELD; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0036368793 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.453 Document Type: Article

Times cited : (9)

References (29)

1
- 0032670585
- (1999) Proc. SPIE Advances in Resist Technology and Processing XVI , vol.3678 , pp. 2-12
- Ito, H.¹

2
- 0001382530
- (1998) J. Photopolym. Sci. Technol. , vol.11 , pp. 379-394
- Ito, H.¹

3
- 0032841905
- (1999) Acc. Chem. Res. , vol.32 , pp. 659-667
- Reichmanis, E.¹ Nalamasu, O.² Houlihan, F.M.³

4
- 0000993597
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 561-570
- Nakano, K.¹ Maeda, K.² Iwasa, S.³ Ohfuji, T.⁴ Hasegawa, E.⁵

5
- 0034584051
- (2000) J. Photopolym. Sci. Technol. , vol.13 , pp. 625-628
- Kajita, T.¹ Ishii, H.² Usui, S.³ Douki, K.⁴ Chawanya, H.⁵ Shimokawa, T.⁶

6
- 0034585499
- (2000) J. Photopolym. Sci. Technol. , vol.13 , pp. 235-236
- Nakano, K.¹ Maeda, K.² Iwasa, S.³ Ohfuji, T.⁴ Hasegawa, E.⁵

7
- 0034776763
- (2001) Proc. SPIE Advances in Resist Technology and Processing XVIII , vol.4345 , pp. 106-118
- Cameron, J.F.¹ Moore, K.² Chan, N.³ Pohlers, G.⁴

8
- 0035751534
- (2000) J. Photopolym. Sci. Technol. , vol.14 , pp. 345-356
- Cameron, J.F.¹ Moore, K.² Chan, N.³ Pohlers, G.⁴

9
- 0025742494
- (1991) Proc. SPIE Advances in ResistTechnology and Processing VIII , vol.1466 , pp. 384-393
- Hacker, N.P.¹ Welsh, K.M.²

10
- 0000166564
- (1993) Adv. Chem. Ser. , vol.236 , pp. 557-572
- Hacker, N.P.¹ Welsh, K.M.²

11
- 0000644621
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 503-510
- Allen, R.D.¹ Opitz, J.² Larson, C.E.³ Wallow, T.I.⁴ DiPietro, R.A.⁵ Breyta, G.⁶ Sooriyakumaran, R.⁷ Hofer, D.C.⁸

12
- 0002414375
- (1997) th International Conference on Photopolymers: Principles, Processes and Materials, Society of Plastics Engineers, Mid-Hudson Section , pp. 120-139
- Cameron, J.F.¹ Kang, D.² King, M.³ Mori, J.M.M.⁴ Virdee, S.⁵ Zydowsky, T.M.⁶ Sinta, R.F.⁷

13
- 0032651659
- (1999) Proc. SPIE Advances in Resist Technology and Processing XVI , vol.3678 , pp. 785-799
- Cameron, J.F.¹ Ablaza, S.L.² Xu, G.³ Yueh, W.⁴

14
- 0000311160
- (1999) J. Photopolym. Sci. Technol. , vol.12 , pp. 607-620
- Cameron, J.F.¹ Ablaza, S.L.² Xu, G.³ Yueh, W.⁴

15
- 0002122206
- (1999) Polym. Mater. Sci. Eng. , vol.81 , pp. 45-46
- Cameron, J.F.¹ Ablaza, S.L.² Xu, G.³ Yueh, W.⁴

16
- 0034268583
- (2000) J. Vac. Sci. Technol. Ser. B , vol.18 , pp. 2543-2550
- Cameron, J.F.¹ Ablaza, S.L.² Xu, G.³ Yueh, W.⁴

17
- 0024883951
- (1989) Polym. Mater. Sci. Eng. , vol.61 , pp. 269-277
- Buhr, G.¹ Dammel, R.² Lindley, C.R.³

18
- 0001104370
- Microelectronics Technology
- (1995) ACS Symp. Ser. , vol.614 , pp. 110-123
- Thackeray, J.¹ Denison, M.² Fedynyshyn, T.³ Kang, D.⁴ Sinta, R.F.⁵

19
- 0024860532
- (1989) Polym. Mater. Sci. Eng. , vol.60 , pp. 45-48
- McKean, D.R.¹ Schaedeli, U.P.² MacDonald, S.A.³

20
- 0001802652
- Polymers in Microlithography
- (1989) ACS Symp. Ser. , vol.412 , pp. 27-38
- McKean, D.R.¹ Schaedeli, U.P.² MacDonald, S.A.³

21
- 0024767894
- (1989) J. Polym. Sci., Part A, Polym. Chem. Ed. , vol.27 , pp. 3927-3935
- McKean, D.R.¹ Schaedeli, U.P.² MacDonald, S.A.³

22
- 0000704898
- (1996) Chem. Mater. , vol.8 , pp. 2654-2658
- Pohlers, G.¹ Virdee, S.² Scaiano, J.C.³ Sinta, R.⁴

23
- 0001575941
- (1997) Chem. Mater. , vol.9 , pp. 3222-3230
- Pohlers, G.¹ Scaiano, J.C.² Sinta, R.³

24
- 0001904481
- Polymers for Microelectronics
- (1994) ACS Symp. Ser. , vol.537 , pp. 53-63
- Takeyama, N.¹ Ueda, Y.² Kusumoto, T.³ Ueki, H.⁴ Hanabata, M.⁵

25
- 0032662522
- (1999) Proc. SPIE Advances in Resist Technology and Processing XVI , vol.3678 , pp. 857-866
- Szmanda, C.R.¹ Kavanagh, R.² Bohland, J.³ Cameron, J.⁴ Trefonas, P.⁵ Blacksmith, R.⁶

26
- 0040707393
- (1999) J. Vac. Sci. Technol. Ser. B , vol.17 , pp. 3356-3361
- Szmanda, C.R.¹ Brainard, R.L.² Mackevich, J.³ Awaji, A.⁴ Tanaka, T.⁵ Yamada, Y.⁶ Bohland, J.⁷ Tedesco, S.⁸ Dal'Zotto, B.⁹ Bruenger, W.¹⁰ Torkler, M.¹¹ Fallman, W.¹² Loeschner, H.¹³ Kaesmaier, R.¹⁴ Nealey, P.M.¹⁵ Pawloski, A.R.¹⁶

27
- 0000954335
- (2000) Proc. SPIE Advances in Resist Technology and Processing XVII , vol.3999 , pp. 190-203
- Cameron, J.F.¹ Fradkin, L.² Moore, K.³ Pohlers, G.⁴

28
- 85036976407
- (2000) th International Conference on Photopolymers: Principles, Processes and Materials, Society of Plastics Engineers, Mid-Hudson Section , pp. 99-114
- Cameron, J.F.¹ Fradkin, L.² Moore, K.³ Pohlers, G.⁴

29
- 33749291941
- and references cited therein
- (1996) J. Photopolym. Sci. Technol. , vol.9 , pp. 475
- Takechi, S.¹ Takahashi, M.² Kotachi, A.³ Nozaki, K.⁴ Yano, E.⁵ Hanyu, I.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.