Hunting the origins of line width roughness with chemical force microscopy

AIP Conference Proceedings

Volumn 931, Issue , 2007, Pages 413-418

  Woodward, John T ^a   Hwang, Jeeseong ^a   Prabhu, Vivek M ^a   Choi, Kwang Woo ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Atomic force microscope; Chemical force microscope; EUV lithography; Latent image; Line width roughness; Photoresist

Indexed keywords

EID: 35348851942     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2799409     Document Type: Conference Paper

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