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Volumn 6923, Issue , 2008, Pages

Effect of PAG and matrix structure on PAG acid generation behavior under UV and high-energy radiation exposure

Author keywords

Chemically amplified resist; Excitation radiation; Ionization radiation; Photoacid generation efficiency; Photoacid generator; Polymer matrix

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; EXCITATION RADIATION; IONIZATION RADIATION; PHOTOACID GENERATION EFFICIENCY; PHOTOACID GENERATOR;

EID: 57349179045     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.782634     Document Type: Conference Paper
Times cited : (21)

References (13)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.