Evaluation of non-ionic photoacid generators for chemically amplified photoresists

Journal of Photopolymer Science and Technology

Volumn 19, Issue 3, 2006, Pages 335-342

  Asakura, Toshikage ^a   Yamato, Hitoshi ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

ArF; Chemically amplified resist; Non ionic; Photoacid generator; Strong acid

Indexed keywords

EID: 33747406656     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.335     Document Type: Article

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