Measuring acid generation efficiency in chemically amplified resists with all three beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3356-3361

  Szmanda, Charles R ^a   Brainard, Robert L ^a   Mackevich, Joseph F ^a   Awaji, Akira ^b   Tanaka, Tsutomu ^b   Yamada, Yutaka ^b   Bohland, John ^a   Tedesco, Serge ^c   Dal'Zotto, Bernard ^c   Bruenger, Wilhelm ^d   Torkler, Michael ^d   Fallmann, Wolfgang ^e   Loeschner, Hans ^f   Kaesmaier, Rainer ^g   Nealey, Paul M ^h   Pawloski, Adam R ^h  

^a SHIPLEY COMPANY   (United States)

^b Shipley Far East Limited   (Japan)

^c CEA LETI   (France)

^d FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^e VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^f IMS   (Austria)

^g SIEMENS AG   (Germany)

^h UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040707393     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591011     Document Type: Article

References (20)

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18. Base quenchers are used commonly in chemically amplified resists. For example, see E. Shiobara, D. Kawamura, K. Matsunaga, T. Koike, S. Mimotogi, T. Azuma, and Y. Onishi, Proc. SPIE 3333, 313 (1998);
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20. In Eq. (3) the absorbance or dose attenuation coefficient a is in base e units. Chemists frequently quote absorbance in base 10 units.