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Chemistry of Materials

Volumn 13, Issue 11, 2001, Pages 4154-4162

A standard addition technique to quantify photoacid generation in chemically amplified photoresist

(3) Pawloski, A R a Christian, a Nealey, P F a

a University of Wisconsin Madison (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID; NORBORNENE DERIVATIVE; PIPERIDINE DERIVATIVE; RESIN; STYRENE DERIVATIVE; TRIFLUOROMETHANESULFONIC ACID;

ARTICLE; CONCENTRATION RESPONSE; DECOMPOSITION; DISSOLUTION; IMAGING; INFRARED SPECTROSCOPY; MEASUREMENT; QUANTUM CHEMISTRY; TECHNIQUE; X RAY ANALYSIS;

EID: 0035180168 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm010529a Document Type: Article

Times cited : (27)

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