A new technique for studying photoacid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Lee, Cheng Tsung ^a   Yueh, Wang ^b   Roberts, Jeanette M ^b   Younkin, Todd R ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Acid sensitive dyes; Chemically amplified resist; Ellipsometry; Photoacid generation efficiency; Photoacid generator

Indexed keywords

32 NM TECHNOLOGIES; ACID GENERATIONS; ANALYTICAL METHODS; CHEMICALLY AMPLIFIED RESIST; CHEMICALLY AMPLIFIED RESISTS; ENERGY RADIATIONS; EXPOSURE SOURCES; HIGH ENERGY RADIATIONS; HIGH SENSITIVITIES; HYDROXYSTYRENE; LITHOGRAPHY TOOLS; MATERIAL SAVINGS; MATRIX DESIGNS; MATRIX RESINS; NEW TECHNIQUES; PHOTOACID; PHOTOACID GENERATION EFFICIENCY; PHOTOACID GENERATOR; PHOTOACID GENERATORS; POLIES (METHYL METHACRYLATE); POLYMER RESINS; POTENTIAL MEASUREMENTS; PROTONATED; RADIATION ABSORPTIONS; RESIST MATERIALS; SHORTER WAVELENGTHS; STRUCTURE PROPERTIES; TRIFLATE; ULTRA VIOLETS;

ABSORPTION; ACIDS; ELECTRON BEAM LITHOGRAPHY; ELLIPSOMETRY; ENERGY UTILIZATION; ESTERS; FILMS; HAND TOOLS; ION BEAMS; MEASUREMENT ERRORS; PHOTOLYSIS; PHOTORESISTS; POLYMER FILMS; POLYMERS; PROTONS; QUANTUM OPTICS; RADIATION CHEMISTRY; RESINS; SUGAR (SUCROSE);

PHOTORESISTORS;

EID: 57349192169     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773393     Document Type: Conference Paper

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