5 nm gap via conventional photolithography and pattern-size reduction technique

International Journal of Physical Sciences

Volumn 6, Issue 15, 2011, Pages 3649-3656

  Dhahi, T S ^a   Ali, M E ^a   Hashim, U ^a   Saif, Ala'eddin A ^a   Nazwa, T ^a  

^a UNIVERSITY MALAYSIA PERLIS   (Malaysia)

Author keywords

Nanogap; Optical and electrical characterization; Pattern size reduction; Photolithography; Wet etching

Indexed keywords

EID: 80052672076     PISSN: 19921950     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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