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Volumn 3, Issue 2, 2011, Pages 233-238

Fabrication and characterization of 50 nm silicon nano-gap structures

Author keywords

Nano gap; Nanostructure; Optical characterization; Pattern size reduction; Photolithography

Indexed keywords


EID: 79958257947     PISSN: 19472935     EISSN: 19472943     Source Type: Journal    
DOI: 10.1166/sam.2011.1155     Document Type: Article
Times cited : (25)

References (34)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.