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Volumn 3, Issue 2, 2011, Pages 233-238
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Fabrication and characterization of 50 nm silicon nano-gap structures
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Author keywords
Nano gap; Nanostructure; Optical characterization; Pattern size reduction; Photolithography
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Indexed keywords
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EID: 79958257947
PISSN: 19472935
EISSN: 19472943
Source Type: Journal
DOI: 10.1166/sam.2011.1155 Document Type: Article |
Times cited : (25)
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References (34)
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