A Nanochannel Fabrication Technique without Nanolithography

Nano Letters

Volumn 3, Issue 10, 2003, Pages 1339-1340

  Lee, Choonsup ^a   Yang, Eui Hyeok ^a   Myung, Nosang V ^a   George, Thomas ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE;

ARTICLE; NANOLITHOGRAPHY; NANOPARTICLE; OXIDATION; PARTICLE SIZE; SURFACE PROPERTY; TECHNIQUE; TEMPERATURE;

EID: 0242351073     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl034399b     Document Type: Article

References (9)

1. Foquet, M.; Korlach, J.; Zipfel, W.; Webb, W. W.; Craighead, H. G. Anal. Chem. 2002, 74, 1415.
2. Burns, M. A., et al. Science 1998, 282, 484.
3. Turner, S. W.; Perez, A. M.; Lopez, A.; Craighead, H. G. J. Vac. Sci. Technol. B 1998, 16(6), 3835.
4. Desai, T. A.; Chu, W. H.; Tu, J. K.; Beattie, G. M.; Hayek, A.; Ferrari, M. Biotechnol. Bioeng. 1998, 57(1), 118.
5. Matsumoto, K.; Kawakami, T.; Nakao, M.; Hatamura, Y.; Kitamori, T.; Sawada, T. Proc. IEEE MEMS 1998, 127.
6. Tas, N. R.; Berenschot, J. W.; Mela, P.; Jansen, H. V.; Elwenspoek, M.; van den Berg, A. Nano Lett. 2002, 2(9), 1031.
7. Hui, A. P.; Qin, S.-j.; Li, W. J.; Wang, M. Y. Proc. IEEE MEMS 2002.
8. Lee, C.; Lee, J.; Han, C. IEEE Electron Device Lett. 2000, 21 (10), 479.
9. Cao, H.; Yu, Z.; Wang, J.; Tegenfeldt, J. O.; Austin, R. H.; Chen, E.; Wu, W.; Chou, S. Y. Appl. Phys. Lett. 2002, 81 (1), 174.