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Volumn 85, Issue 5-6, 2008, Pages 1275-1277

Fabrication of silicon dioxide nanochannel arrays without nanolithography for manipulation of DNA molecule

Author keywords

KOH anisotropic etching; LOCOS; Single DNA stretching; SiO2 nanochannel

Indexed keywords

ANISOTROPIC ETCHING; DNA; NANOLITHOGRAPHY; PLASMA ETCHING; SILICA;

EID: 44149101439     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.03.001     Document Type: Article
Times cited : (11)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.