Formation of nanometer-scale structures using conventional optical lithography

Thin Solid Films

Volumn 516, Issue 7, 2008, Pages 1489-1492

  Kim, Kyoung S ^a   Kyoung Nam Lee, ^a   Roh, Yonghan ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Nano fabrication; Photoresist; Plasma Ashing

Indexed keywords

ASPECT RATIO; DEPOSITION; NANOTECHNOLOGY; PHOTORESISTS;

NEGATIVE PHOTO RESISTS; PLASMA ASHING;

NANOSTRUCTURED MATERIALS;

EID: 38649086130     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.077     Document Type: Article

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