Fabrication of sub-10-nm silicon nanowire arrays by size reduction lithography

Journal of Physical Chemistry B

Volumn 107, Issue 15, 2003, Pages 3340-3343

  Choi, Yang Kyu ^a   Zhu, Ji ^a,b   Grunes, Jeff ^a,b   Bokor, Jeffrey ^a   Somorjai, Gabor A ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; BIOSENSORS; ETCHING; LITHOGRAPHY; POLYMERS; WIRE;

NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 0345373824     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0222649     Document Type: Article

References (13)

1. Cui, Y.; Wei, Q. Q.; Park, H. K.; Lieber, C. M. Science 2001, 295, 1289.
2. Anderson, E. H.; Olynick, D. L.; Harteneck, B.; Veklerov, E.; Denbeaux, G.; Chao, W. L.; Lucero, A.; Johnson, L.; Attwood, D. J. Vac. Sci. Technol B 2000, 18, 2970.
3. Grunes, J.; Zhu, J.; Anderson, E. A.; Somorjai, G. A. J. Phys. Chem. B 2002, 106, 11463.
4. Vieu, C.; Carcenac, F.; Pepin, A.; Chen, Y.; Mejias, M.; Lebib, A.; Manin-Ferlazzo, L.; Couraud, L.; Launois, H. Appl. Surf. Sci. 2000, 164, 111.
5. Piner, R. D.; Zhu, J.; Xu, F.; Hong, S. H.; Mirkin, C. A. Science 1999, 283, 661.
6. Cronin, J. E.; Kaanta, C. W. U.S. Patent 5,795,830.
7. Yu, Z.; Wu, W.; Chen, L.; Chou, S. Y. J. Vac. Sci. Technol. B 2001, 19, 2816.
8. Cherniavskaya, O.; Adzic, A.; Knutson, C.; Gross, B. J.; Zang, L.; Liu, R.; Adams, D. M. Langmuir 2002, 78, 7029.
9. Choi, Y. K.; King, T. J.; Hu, C. IEEE Trans. Electron. Devices 2002, 49, 436.
10. Choi, Y. K.; King, T. J.; Hu, C. IEEE Electron. Device Lett. 2002, 23, 25.
11. Choi, Y. K.; King, T. J.; Hu, C. Solid-State Electron. 2002, 46, 1595.
12. Kao, D. B.; McVittie, J. P.; Nix, W. D.; Saraswat, K. C. IEEE Trans. Electron. Devices 1987, 34, 1008.
13. Kao, D. B.; McVittie, J. P.; Nix, W. D.; Saraswat, K. C. IEEE Trans. Electron. Devices 1988, 55, 25.