Novel nano-fabrication technique with low edge roughness

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4169-4172

  Hashioka, Shingi ^a   Mogi, Takahiro ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Anodic oxidation; Nano edge roughness; Nano fabrication; Nanometer slit mask; Photolithography

Indexed keywords

ANODIC OXIDATION; ELECTRON BEAMS; MASKS; PHOTOLITHOGRAPHY;

NANO EDGE ROUGHNESS;

NANOTECHNOLOGY;

EID: 0041360355     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4169     Document Type: Conference Paper

References (7)

1. K. Nakazato and J. D. White: Int. Electron Device Meet. Tech. Dig. (1992) p. 487.
2. K. Fukushima, R. Sasajima, K. Fujimaru and H. Matsumura: Jpn. J. Appl. Phys. 38 (1999) 7233.
3. V. Bubanja, K. Matsumoto and Y. Gotoh: Jpn. J. Appl. Phys. 40 (2001) 87.
4. E. S. Snow, P. M. Campbell, R. W. Rendell, F. A. Buot, D. Park, C. R. K. Marrian and R. Magno: Appl. Phys. Lett. 72 (1998) 3071.
5. S. Hashioka and H. Matsumura: Jpn. J. Appl. Phys. 39 (2000) 7063.
6. K. Fujimaru, T. Ono, R. Nagai and H. Matsumura: Jpn. J. Appl. Phys. 36 (1997) 7786.
7. H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase and K. Kurihara: J. Vac. Sci. & Teohnol. B 16 (1998) 69.