Fabrication technique for preparing nanogap electrodes by conventional silicon processes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 6 A, 2005, Pages 4213-4215

  Hashioka, Shingi ^a,b,c   Tsuritani, Hiroyuki ^b   Obata, Tsutomu ^b   Kadosaki, Masahiro ^b   Fujiki, Satoshi ^b   Tanino, Katsumi ^b  

^a Toyama New Industry Organization   (Japan)

^b TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Au electrode; DNA chip; Mass production; Nano fabrication; Nano sensor; Stencil substrate

Indexed keywords

DNA; ETCHING; FABRICATION; GOLD; OXIDATION; PHOTOLITHOGRAPHY; SILICON; SUBSTRATES;

AU ELECTRODES; DNA CHIP; MASS PRODUCTION; NANO FABRICATION; NANO SENSOR; STENCIL SUBSTRATES;

ELECTRODES;

EID: 23944479695     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.4213     Document Type: Article

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