Sub-10 nm patterning using EUV interference lithography

Nanotechnology

Volumn 22, Issue 37, 2011, Pages

  Päivänranta, Birgit ^a,b   Langner, Andreas ^a,b   Kirk, Eugenie ^a,b   David, Christian ^a,b   Ekinci, Yasin ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ACADEMIC RESEARCH; EXTREME ULTRAVIOLETS; FEATURE SIZES; HIGH-VOLUME MANUFACTURING; INTERFERENCE LITHOGRAPHY; LEADING TECHNOLOGY; NANOPATTERNING; PHASE MASKS; TABLE-TOP; TRANSMISSION GRATINGS;

INDUSTRIAL RESEARCH; MANUFACTURE; MOLYBDENUM;

LITHOGRAPHY;

EID: 80051958121     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/37/375302     Document Type: Article

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