Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates

Optics Communications

Volumn 229, Issue 1-6, 2004, Pages 109-116

  Naulleau, Patrick P ^a   Liddle, J Alexander ^a   Anderson, Erik H ^a   Gullikson, Eric M ^a   Mirkarimi, Paul ^b   Salmassi, Farhad ^a   Spiller, Eberhard ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Blazed grating; Diffractive optics; Electron beam lithography; Extreme ultraviolet; Multilayer coating

Indexed keywords

ANNEALING; APPROXIMATION THEORY; BACKSCATTERING; DIFFRACTIVE OPTICS; ELECTROMAGNETIC WAVE DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; LIGHT MODULATION; LIGHT REFLECTION; MICROELECTRONIC PROCESSING; MULTILAYERS; OPTICAL COATINGS; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; X RAYS;

BLAZED GRATINGS; DIFFRACTION EFFICIENCY; MULTILAYER COATINGS;

DIFFRACTION GRATINGS;

EID: 0347593748     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2003.11.005     Document Type: Article

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