Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 9, Issue 4, 2010, Pages

  Pret, Alessandro Vaglio ^a   Gronheid, Roel ^a   Foubert, Philippe ^a  

^a IMEC   (Belgium)

Author keywords

3 ; Frequency analysis; Line width roughness; Post lithography process; Smoothing techniques

Indexed keywords

FREQUENCY DOMAIN ANALYSIS; LINEWIDTH;

CHEMICAL PROCESS; CRITICAL DIMENSION; DIFFERENT FREQUENCY; FREQUENCY ANALYSIS; FREQUENCY DOMAINS; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; ION-BEAM SPUTTERING; LINEWIDTH ROUGHNESS; POST-LITHOGRAPHY PROCESS; SMOOTHING TECHNIQUES;

LITHOGRAPHY;

EID: 79959979694     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3494614     Document Type: Conference Paper

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