Line Width Roughness mitigation in chemically amplified resist by post-litho processes

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1127-1130

  Vaglio Pret, Alessandro ^a   Gronheid, Roel ^a  

^a IMEC   (Belgium)

Author keywords

LWR; Post litho processes; PSD; Smoothing techniques

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; HARD BAKE; HIGH FREQUENCY; LINEWIDTH ROUGHNESS; LITHO PROCESS; OFF-LINE ANALYSIS; SEM; SMOOTHING PROCESS; SMOOTHING TECHNIQUES; SPATIAL AND FREQUENCY DOMAIN;

FREQUENCY DOMAIN ANALYSIS; PHOTORESISTORS; PHOTORESISTS; PULSE SHAPING CIRCUITS;

ROUGHNESS MEASUREMENT;

EID: 76949086172     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.038     Document Type: Article

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