Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Rathsack, Benjamen ^a   Nafus, Kathleen ^b   Hatakeyama, Shinichi ^b   Kuwahara, Yuhei ^b   Kitano, Junichi ^b   Gronheid, Roei ^c   Pret, Alessandro Vaglio ^c  

^a TOKYO ELECTRON AMERICA INC   (United States)

^b TOKYO ELECTRON LTD   (Japan)

^c IMEC   (Belgium)

Author keywords

LER; Lithography simulation; Micro bridging; Resist sensitivity; Resolution

Indexed keywords

LER; LITHOGRAPHY SIMULATION; MICRO-BRIDGING; RESIST SENSITIVITY; RESOLUTION;

DISSOLUTION; EDUCATION; ELECTRON BEAM LITHOGRAPHY; EXPERIMENTS; EXTREME ULTRAVIOLET LITHOGRAPHY; INTERCONNECTION NETWORKS; PHOTORESISTS; SPACE PLATFORMS;

SIMULATORS;

EID: 65849111007     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814287     Document Type: Conference Paper

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