Resolution and LWR improvements by acid diffusion control in EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Tsubaki, Hideaki ^a   Tsuchihashi, Tooru ^a   Tsuchimura, Tomotaka ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

Chemically amplified resist; EUV lithography; LWR; Photoacid generator; Resolution

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; EUV LITHOGRAPHY; LWR; PHOTOACID GENERATOR; RESOLUTION;

ACIDS; DIFFUSION; ELECTROLUMINESCENCE; EXTREME ULTRAVIOLET LITHOGRAPHY; NEGATIVE IONS; PHOTORESISTORS; ULTRAVIOLET DEVICES;

PHOTORESISTS;

EID: 65849133854     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814067     Document Type: Conference Paper

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