Speckle in optical lithography and its influence on linewidth roughness

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Noordman, Oscar ^a   Tychkov, Andrey ^a   Baselmans, Jan ^a   Tsacoyeanes, James ^b   Politi, Gary ^b   Patra, Michael ^c   Blahnik, Vladan ^c   Maul, Manfred ^c  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

Excimer laser; Linewidth roughness; Spatial coherence; Speckle; Temporal coherence

Indexed keywords

EXCIMER LASERS; LINEWIDTH; PHOTOLITHOGRAPHY; ROUGHNESS MEASUREMENT;

FUTURE TECHNOLOGIES; ILLUMINATION CONDITIONS; INTENSITY DISTRIBUTION; INTERFERENCE EFFECTS; LASER LIGHTS; LINEWIDTH ROUGHNESS; OPTICAL PROJECTIONS; SPATIAL COHERENCE; SPATIAL FREQUENCY; SPECKLE PATTERNS; TEMPORAL COHERENCE;

SPECKLE;

EID: 77953499429     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3256131     Document Type: Conference Paper

References (7)

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