Spatial scaling metrics of mask-induced line-edge roughness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 1903-1910

  Naulleau, Patrick P ^a   Gallatin, Gregg ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Applied Math Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION LENGTHS; DEFOCUS; DESCRIPTORS; EDGE ROUGHNESSES; EVALUATION TESTS; ILLUMINATION CONDITIONS; MASK ABSORBERS; MULTILAYER ROUGHNESSES; POWER SPECTRAL; PROMISING TECHNIQUES; RANDOM PHASE; REFLECTED BEAMS; ROUGHNESS EXPONENTS; SPATIAL CHARACTERISTICS; SPATIAL SCALING;

PETROLEUM RESERVOIR EVALUATION; POWER SPECTRAL DENSITY;

ROUGHNESS MEASUREMENT;

EID: 57249108247     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3010712     Document Type: Article

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