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Volumn 7273, Issue , 2009, Pages

Main chain decomposable star shaped polymer for EUV resist

Author keywords

Acid diffusion; Arm; Core; EUVL; Main chain decomposable; PHS; STAR polymer; Tg

Indexed keywords

ACID DIFFUSION; ARM; CORE; EUVL; MAIN CHAIN DECOMPOSABLE; STAR POLYMER; TG;

EID: 65849502444     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813990     Document Type: Conference Paper
Times cited : (16)

References (11)
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  • 2
    • 25144499519 scopus 로고    scopus 로고
    • Resist blur and line edge roughness
    • G. M. Gallatin, "Resist Blur and Line Edge Roughness," Proc. SPIE 5754, (2005) 38.
    • (2005) Proc. SPIE , vol.5754 , pp. 38
    • Gallatin, G.M.1
  • 3
    • 57649094153 scopus 로고    scopus 로고
    • Feasibility study of high-sensitivity chemically amplified resist by polymer absorption enhancement in extreme ultraviolet lithography
    • T. Kozawa, K. Okamoto, J. Nakamura, and S. Tagawa, "Feasibility study of High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography," Appl. Phys. Express 1 (2008) 067012.
    • (2008) Appl. Phys. Express , vol.1 , pp. 067012
    • Kozawa, T.1    Okamoto, K.2    Nakamura, J.3    Tagawa, S.4
  • 4
    • 55049106088 scopus 로고    scopus 로고
    • Effects of rate constant for deprotection on latent image formation in chemically amplified extreme ultraviolet resists
    • T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi and T. Itani, "Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists," Jpn. J. Appl. Phys., 47 (2008) 4926
    • (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 4926
    • Kozawa, T.1    Tagawa, S.2    Santillan, J.J.3    Toriumi, M.M.4    Itani, T.5
  • 5
    • 0034352181 scopus 로고    scopus 로고
    • g and reaction rate with film thickness in photoresist: A thermal probe study
    • g and reaction rate with film thickness in photoresist: A thermal probe study," J. Vac. Sci. Technol., B18 (2000) 3376.
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    • Fryer, D.1    Nealey, P.2    De Pablo, J.3
  • 9
    • 36148974786 scopus 로고    scopus 로고
    • Development of EUV resists in university of hyogo
    • T. Watanabe and H. Kinoshita, "Development of EUV Resists in University of Hyogo," J. Photopolym. Sci. Technol., 21 (2007) 421.
    • (2007) J. Photopolym. Sci. Technol. , vol.21 , pp. 421
    • Watanabe, T.1    Kinoshita, H.2
  • 10
    • 57549115796 scopus 로고    scopus 로고
    • Resist development to improve flare issue for EUV lithography
    • M. Irie, T. Suzuki, T. Mimura, and T. Iwai, "Resist development to improve flare issue for EUV Lithography," Proc. SPIE 6923, (2008) 692310-692311
    • (2008) Proc. SPIE , vol.6923 , pp. 692310-692311
    • Irie, M.1    Suzuki, T.2    Mimura, T.3    Iwai, T.4
  • 11
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    • Changes in resist glass transition temperatures due to exposure
    • T. H. Fedynyshyn, I. Pottebaum, A. Cabral, and J. Roberts, "Changes in Resist Glass Transition Temperatures Due to Exposure," Proc. SPIE 6519, (2007) 651917
    • (2007) Proc. SPIE , vol.6519 , pp. 651917
    • Fedynyshyn, T.H.1    Pottebaum, I.2    Cabral, A.3    Roberts, J.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.