Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization

Applied Optics

Volumn 42, Issue 17, 2003, Pages 3390-3397

  Naulleau, Patrick P ^a   Gallatin, Gregg M ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; SURFACE ROUGHNESS; TRANSFER FUNCTIONS; ULTRAVIOLET RADIATION;

LINE EDGE ROUGHNESS (LER);

PHOTORESISTS;

EID: 0041592534     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.003390     Document Type: Article

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