Residual speckle in a lithographic illumination system

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Gallatin, Gregg M ^a,e   Kita, Naonori ^b   Ujike, Tomoko ^c   Partlo, Bill ^d  

^a Applied Math Solutions   (United States)

^b NIKON CORPORATION   (Japan)

^c Optical Research Laboratory   (Japan)

^d CYMER INC   (United States)

^e Center for Nanoscale Science and Technology   (United States)

Author keywords

Illumination; Line edge roughness; Lithography; Speckle

Indexed keywords

BANDWIDTH; ROUGHNESS MEASUREMENT;

EXPOSURE TIME; FINITE BANDWIDTH; FUNDAMENTAL LIMITS; ILLUMINATION SYSTEM; LINE EDGE ROUGHNESS; NONUNIFORMITY;

SPECKLE;

EID: 77953518345     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3256007     Document Type: Article

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