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Journal of Applied Physics

Volumn 109, Issue 11, 2011, Pages

Fluorine effect on as diffusion in Ge

(7) Impellizzeri, G a Boninelli, S a Priolo, F a Napolitani, E b Spinella, C c Chroneos, A d Bracht, H e

a UNIVERSITY OF CATANIA (Italy)

b UNIVERSITY OF PADOVA (Italy)

c CNR (Italy)

d UNIVERSITY OF CAMBRIDGE (United Kingdom)

e UNIVERSITY OF MÜNSTER (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AS-IMPLANTATION; CHEMICAL INTERACTIONS; DAMAGED REGION; DENSITY FUNCTIONAL THEORY CALCULATIONS; DONOR ATOMS; DOPANT DIFFUSION; END-OF-RANGE; ENHANCED DIFFUSION; FLUORINE EFFECT; FUTURE GENERATIONS; INTERSTITIALS; MATRIX; PHYSICAL MECHANISM; SOLID PHASE EPITAXY; THEORETICAL CALCULATIONS;

ARSENIC; COMPLEXATION; DENSITY FUNCTIONAL THEORY; DIFFUSION; DOPING (ADDITIVES); FLUORINE;

GERMANIUM;

EID: 79959450156 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3592962 Document Type: Article

Times cited : (80)

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